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Effect of copper ions implantation on corrosion behavior of zircaloy-2 in 1 M H2SO4

机译：铜离子注入对Zircaloy-2在1 M H2SO4中腐蚀行为的影响

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In order to study the effect of copper ion implantation on the aqueous corrosion behavior of zircaloy-2, specimens were implanted with copper ions with fluence ranging from 1 X 10(-16) to 1 x 10-(17) ions cm(-2), using a metal vapor vacuum arc source (MEVVA) at an extraction voltage of 40 kV. The valence states and depth distributions of elements in the surface layer of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), respectively. Transmission electron microscopy (TEM) was used to examine the microstructure of the copper-implanted samples. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted zircaloy-2 in a 1 M H2SO4 solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zircaloy-2 implanted with copper ions compared with as-received zircaloy-2. The corrosion resistance of implanted samples declined with increasing the fluence. Finally, the mechanism of the corrosion behavior of copper-implanted zircaloy-2 was discussed. (c) 2005 Elsevier B.V. All rights reserved.
机译：为了研究铜离子注入对Zircaloy-2的水腐蚀行为的影响，向标本中注入了通量范围为1 X 10（-16）至1 x 10-（17）cm（-2）的铜离子。 ），使用金属蒸气真空电弧源（MEVVA），抽取电压为40 kV。通过X射线光电子能谱（XPS）和俄歇电子能谱（AES）分别分析了样品表面层中元素的价态和深度分布。透射电子显微镜（TEM）用于检查铜植入样品的微观结构。电位动力极化技术用于评估在1 M H2SO4溶液中注入的Zircaloy-2的耐水腐蚀性能。发现与原样的Zircaloy-2相比，植入了铜离子的Zircaloy-2的耐水腐蚀性显着提高。注入样品的耐腐蚀性随通量的增加而下降。最后，讨论了注入铜的Zircaloy-2腐蚀行为的机理。 （c）2005 Elsevier B.V.保留所有权利。

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