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机译:亚微米厚的独立铜膜的疲劳裂纹闭合
Department of Mechanical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
Department of Mechanical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
Department of Mechanical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
Department of Mechanical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan;
Thin films; Fatigue; Crack propagation; Crack closure; Copper;
机译:亚微米厚的独立式铜膜疲劳裂纹萌生机理
机译:真空对亚微米厚独立铜膜疲劳裂纹扩展的影响
机译:厚度对亚微米厚独立铜膜疲劳裂纹扩展的影响
机译:真空环境中亚微米厚的独立铜膜的疲劳裂纹繁殖特性
机译:使用压缩预裂纹测试方法在宽负荷比范围内的铝合金7050和9310钢的疲劳裂纹扩展和裂纹闭合行为
机译:试样厚度和应力强度因子范围对A7075-T6合金塑性诱导疲劳裂纹闭合的影响
机译:亚微米厚独立式铜膜在真空环境下的疲劳裂纹扩展特性
机译:裂纹闭合对模拟短裂纹疲劳裂纹扩展影响的评价