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首页> 外文期刊>Materials Science and Engineering >Optical characterization of BCN films deposited at various N_2/Ar gas flow ratios by RF magnetron sputtering
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Optical characterization of BCN films deposited at various N_2/Ar gas flow ratios by RF magnetron sputtering

机译：通过射频磁控溅射以不同的N_2 / Ar气体流量比沉积的BCN膜的光学表征

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摘要

We present the deposition and optical characterization of amorphous thin films of boron carbonitride (BCN). The BCN thin films were deposited in a radio frequency magnetron sputtering system using a B4C target. Films of different compositions were deposited by varying the ratio of argon and nitrogen gas in the sputtering ambient. X-ray photoelectron spectroscopy was used to perform surface characterization of the deposited films and a change in composition with nitrogen flow ratio was observed. The effect of gas flow ratios on the optical properties of the films was also investigated. It was found that the transmittance of the films increases with nitrogen incorporation. The optical band gap of the films ranged from 2.0 eV to 3.1 eV and increased with N_2/Ar gas flow ratio except at the highest ratio.
机译：我们介绍了碳氮化硼（BCN）的非晶薄膜的沉积和光学表征。使用B4C靶在射频磁控溅射系统中沉积BCN薄膜。通过改变溅射环境中氩气和氮气的比例来沉积不同组成的薄膜。使用X射线光电子能谱对沉积膜进行表面表征，并观察到组成随氮气流量比的变化。还研究了气体流量比对薄膜光学性能的影响。发现膜的透射率随氮的引入而增加。薄膜的光学带隙在2.0 eV到3.1 eV的范围内，并随N_2 / Ar气体流量比的增加而增加，除非比例最高。

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  • 来源
    《Materials Science and Engineering》 |2011年第12期|p.878-882|共5页
  • 作者

    Vinit O. Todi; Bojanna P. Shantheyanda; Ravi M. Todi; Kalpathy B. Sundaram; Kevin Coffey;

  • 作者单位

    Department of Electrical Engineering and Computer Science. University of Central Florida, Orlando. FL 32816. United States;

    Department of Electrical Engineering and Computer Science. University of Central Florida, Orlando. FL 32816. United States;

    Department of Electrical Engineering and Computer Science. University of Central Florida, Orlando. FL 32816. United States;

    Department of Electrical Engineering and Computer Science. University of Central Florida, Orlando. FL 32816. United States;

    Advanced Materials Processing and Analysis Center, University of Central Florida. Orlando, FL 32816, United States;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Sputtering; BCN; Optical properties; Band gap;

    机译：溅射;BCN;光学性质;带隙;

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