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首页> 外文期刊>Materials Science and Engineering >Structural, optical, and morphological properties of laser ablated ZnO doped Ta_2O_5 films
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Structural, optical, and morphological properties of laser ablated ZnO doped Ta_2O_5 films

机译：激光烧蚀掺杂ZnO的Ta_2O_5薄膜的结构，光学和形貌特性

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摘要

ZnO doped tantalum oxide films (doping concentration 0,1,3 and 5 wt.%) have been prepared by pulsed laser deposition technique in reactive oxygen atmosphere and the films are annealed at temperatures 973 and 1173 K. The films are characterized using grazing incidence X-ray diffraction (GIXRD), micro-Raman and Fourier transform infrared (FTIR) spectroscopy, atomic force microscopy (AFM) and UV-visible spec-troscopy. XRD analysis shows that the ZnO doped films annealed at 973 K are crystalline in nature, whereas, the annealed counterpart of pure Ta_2O_5 is amorphous. On annealing at 1173 K, the undoped film shows good crystallinity, whereas, the ZnO doped film presents a decline in crystallinity compared to that of the films annealed at 973 K. The lattice constants, particle size and biaxial strains of the films are calculated from the XRD data. FTIR and micro-Raman measurements confirm the presence of Ta-O, Ta-O-Ta and O-Ta-0 bands in the films. Ta_2O_5 nanorings of diameter around 700 nm have been observed in the AFM micrographs of 3 and 5 wt.% ZnO doped Ta_2O_5 films. Optical parameters like transmittance, reflectance, band gap energy, refractive index, and extinction coefficient of the films are calculated and are found to vary with ZnO doping.
机译：ZnO掺杂的钽氧化物薄膜（掺杂浓度为0.1、3和5 wt。％）已通过脉冲激光沉积技术在活性氧气氛中制备，并在973和1173 K的温度下退火。该薄膜的特征在于掠入射X射线衍射（GIXRD），显微拉曼和傅立叶变换红外（FTIR）光谱，原子力显微镜（AFM）和紫外可见光谱。 XRD分析表明，在973 K退火的ZnO掺杂薄膜本质上是晶体，而纯Ta_2O_5的退火对应物是非晶态。在1173 K的退火温度下，未掺杂的薄膜显示出良好的结晶度，而与973 K退火的薄膜相比，ZnO掺杂的薄膜的结晶度下降。薄膜的晶格常数，粒度和双轴应变由下式计算： XRD数据。 FTIR和显微拉曼测量证实了薄膜中存在Ta-O，Ta-O-Ta和O-Ta-0谱带。在3和5重量％的ZnO掺杂的Ta_2O_5膜的AFM显微照片中已经观察到直径约为700nm的Ta_2O_5纳米环。计算薄膜的光学参数，如透射率，反射率，带隙能量，折射率和消光系数，发现它们随ZnO掺杂而变化。

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