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首页> 外文期刊>Materials Science and Engineering. B, Solid-State Materials for Advanced Technology >Influence of the silicon concentration on the optical and electrical properties of reactively sputtered Zr-Si-N nanocomposite coatings
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Influence of the silicon concentration on the optical and electrical properties of reactively sputtered Zr-Si-N nanocomposite coatings

机译：硅浓度对反应溅射Zr-Si-N纳米复合涂层光学和电学性质的影响

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摘要

Zr-Si-N films were deposited on silicon and X38CrMoV5 steel substrates by sputtering composite Zr-Si targets in reactive Ar-N_2 mixture. The silicon concentration in the deposited films was adjusted by the variation of the number of Si chips located on the target erosion zone. As a function of the silicon content, the films exhibited the following structures: insertion of Si into the ZrN lattice, nanocomposite (nc-ZrN/a-SiN_x) and an amorphous-like structure. Addition of silicon into ZrN-based coatings induced a lost of the golden aspect due to the decrease of the metallic behaviour. This result was confirmed by ellipsometric measurements. The films refractive index increased with the silicon concentration. On the other hand, a continuous decrease of the extinction coefficient was noticed. The effect of the silicon content on the optical properties of Zr-Si-N films was discussed as a function of the films structure and the occurrence of new optical absorptions due to the silicon chemical bonds. Finally, the evolution of the films electrical resistivity was discussed in connection to the films structure changes.
机译：通过在反应性Ar-N_2混合物中溅射复合Zr-Si靶，在硅和X38CrMoV5钢基底上沉积Zr-Si-N膜。通过改变位于靶腐蚀区上的硅片的数量来调节沉积膜中的硅浓度。作为硅含量的函数，这些膜表现出以下结构：Si插入ZrN晶格，纳米复合材料（nc-ZrN / a-SiN_x）和非晶态结构。由于金属行为的减少，在基于ZrN的涂层中添加硅会导致失去金色外观。该结果通过椭偏测量得到证实。膜的折射率随硅浓度的增加而增加。另一方面，消光系数持续下降。讨论了硅含量对Zr-Si-N薄膜光学性能的影响，该影响与薄膜结构以及由于硅化学键而产生新的光吸收有关。最后，讨论了薄膜电阻率与薄膜结构变化的关系。

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