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Bimodal distribution of damage morphology generated by ion implantation

机译：离子注入产生的损伤形态的双峰分布

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摘要

A nucleation and evolution model of damage based on amorphous pockets (APs) has recently been developed and implemented in an atomistic kinetic Monte Carlo simulator. In the model, APs are disordered structures (Ⅰ_nⅤ_m), which are agglomerates of interstitials (Ⅰ) and vacancies (Ⅴ). This model has been used to study the composition and size distribution of APs during different ion implantations. Depending strongly on the dose rate, ion mass and implant temperature, the APs can evolve to a defect population where the agglomerates have a similar number of Ⅰ and Ⅴ (n ≈ m), or to a defect population with pure Ⅰ (m ≈ 0) and pure Ⅴ (n ≈ 0) clusters, or a mixture of APs and clusters. This behaviour corresponds to a bimodal (APs/clusters) distribution of damage. As the AP have different thermal stability compared to the Ⅰ and Ⅴ clusters, the same damage concentration obtained through different implant conditions has a different damage morphology and, consequently, exhibit a different resistance to subsequent thermal treatments.
机译：最近已经开发了基于无定形腔（AP）的损伤成核和演化模型，并在原子动力学蒙特卡洛模拟器中实现了该模型。在该模型中，AP是无序结构（Ⅰ_nⅤ_m），是间隙（Ⅰ）和空位（Ⅴ）的聚集体。该模型已用于研究不同离子注入过程中AP的组成和尺寸分布。在很大程度上取决于剂量率，离子质量和注入温度，AP可以演变成聚集体具有相似数量的Ⅰ和Ⅴ（n≈m）的缺陷群体，或演变成纯Ⅰ（m≈0）的缺陷群体。 ）和纯Ⅴ（n≈0）个簇，或者AP和簇的混合。此行为对应于损害的双峰（AP /簇）分布。由于AP与Ⅰ和Ⅴ团簇相比具有不同的热稳定性，所以通过不同的植入条件获得的相同损伤浓度具有不同的损伤形态，因此对后续热处理表现出不同的抵抗力。

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