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首页> 外文期刊>Microelectronic Engineering >A study on the application of electromagnetic-field-assisted magnetic soft mold photocuring imprinting technology in micro-structure gradient replication molding
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A study on the application of electromagnetic-field-assisted magnetic soft mold photocuring imprinting technology in micro-structure gradient replication molding

机译：电磁场辅助磁性软模光固化压印技术在微结构梯度复制成型中的应用研究

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摘要

This study proposed a new imprinting process using electromagnetic-field- assisted imprinting technology, a composite PDMS magnetic soft mold, and UV-LED arrays photocuring equipment to change an even microlens mold by imprinting the replication into a gradient microlens structure. This function is similar to the continuous gray scale technology of the semi-conductor industry. However, the structural appearance, as defined by the gray scale photo mask process, is smoother and continuous. As the method only requires one time of imprinting, the process is simple, with lower cost and higher competitiveness, thus providing a more effective alternative for imprinting technology and applications. This study used pressure-sensitive film to explore the imprinting pressure distribution of gradient magnetic soft molding. The imprinting results showed that, magnetic powder is distributed in a linear tilting pattern that is consistent with pressure measurement distribution. Hence, the magnetic powder casting angle control of a precision tilt platform can achieve gradient control of imprinting pressure. Finally, the observations and analysis by instruments, including SEM, a surface profiler, and a Laser Scanning Confocal Microscope, confirmed that the gradient magnetic PDMS film made using a precision tilt platform to control the magnetic powder casting angle, coupled with electromagnetic-field-assisted imprinting and UV-LED arrays light curing technology, can replicate the gradient microlens arrays structure of the same tilt angle through one imprinting.
机译：这项研究提出了一种新的压印工艺，该工艺采用电磁场辅助压印技术，复合PDMS磁性软模和UV-LED阵列光固化设备，通过将复制品压印成梯度微透镜结构来改变均匀的微透镜模具。此功能类似于半导体行业的连续灰度技术。然而，由灰阶光掩模工艺所定义的结构外观更平滑且连续。由于该方法仅需压印一次，因此工艺简单，成本较低，竞争力更高，从而为压印技术和应用提供了更有效的替代方法。本研究使用压敏薄膜来探索梯度磁性软成型的压印压力分布。压印结果表明，磁粉呈线性倾斜模式分布，与压力测量分布一致。因此，精密倾斜平台的磁性粉末浇铸角度控制可以实现压印压力的梯度控制。最后，通过包括SEM，表面轮廓仪和激光扫描共聚焦显微镜在内的仪器进行的观察和分析，证实了使用精密倾斜平台制成的梯度磁性PDMS膜可控制磁性粉末的浇铸角度，并结合电磁场辅助压印和UV-LED阵列光固化技术，可以通过一次压印来复制相同倾斜角度的渐变微透镜阵列结构。

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  • 来源
    《Microelectronic Engineering》 |2012年第8期|p.76-81|共6页
  • 作者

    Yung-Chun Weng; Yung-Jin Weng; Sen-Yeu Yang;

  • 作者单位

    Department of Mechanical Engineering, National Taiwan University, Taipei 106, Taiwan;

    Department of Mechanical and Computer-Aided Engineering, National Formosa University, Yunlin 632, Taiwan Department of Information Communications, Kainan University, Taoyuan County 338, Taiwan;

    Department of Mechanical Engineering, National Taiwan University, Taipei 106, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    electromagnetic-assisted imprinting; gradient magnetic soft molding; UV-LED arrays; microlens arrays;

    机译：电磁辅助压印梯度磁性软成型;UV-LED阵列;微透镜阵列;

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