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Analysis of the effective reflectance of digital micromirror devices and process parameters for maskless photolithography

机译：无掩模光刻数字微镜器件的有效反射率和工艺参数分析

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摘要

The evaluation of the effective reflectance of digital micromirror devices (DMD) is used to predict exposure doses in optical maskless photolithography applications. The effective reflectance is determined by multiplying the diffraction efficiency by the reflectance of the DMD in a dynamic mode. The diffraction efficiency is calculated using multiple slit diffraction theory and the two-dimensional grating equation for the wavelengths of the lithography sources, G-line (436 nm), H-line (405 nm), and I-line (365 nm). The diffraction efficiency is also used to determine the optimized dimensions of a DMD's pitch size. The reflectance of the DMD in a dynamic mode linearly decreases as the frame rate increases, dropping by ~8% at a frame rate of 16,000 frames per second. The process parameters are analyzed in the terms of spot overlap and blur, which can have an effect on pattern quality. The spot overlap tends to increase with the frame rate of DMD, and it decreases with the stage speed. The spot blur, analyzed as a function of the illumination time and stage sDeed. also shows proportional behavior with those parameters.
机译：对数字微镜器件（DMD）的有效反射率的评估用于预测无掩模光学光刻应用中的曝光剂量。通过在动态模式下将衍射效率乘以DMD的反射率来确定有效反射率。使用多重狭缝衍射理论和二维光栅方程式计算光刻效率，G线（436 nm），H线（405 nm）和I线（365 nm）的波长，得出衍射效率。衍射效率还用于确定DMD间距尺寸的最佳尺寸。动态模式下DMD的反射率会随着帧速率的增加而线性降低，在每秒16,000帧的帧速率下下降约8％。根据斑点重叠和模糊分析工艺参数，这可能会影响图案质量。光斑重叠倾向于随着DMD的帧速率而增加，而随着载物台速度而降低。根据照明时间和阶段sDeed进行分析的斑点模糊。还显示了这些参数的比例行为。

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  • 来源
    《Microelectronic Engineering》 |2011年第3期|p.235-239|共5页
  • 作者

    Hoonchul Ryoo; Dong Won Kang; Jae W. Hahn;

  • 作者单位

    Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 134, Shinchon-dong, Seodaemun-gu, Seoul 120-749, Republic of Korea;

    Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 134, Shinchon-dong, Seodaemun-gu, Seoul 120-749, Republic of Korea;

    Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 134, Shinchon-dong, Seodaemun-gu, Seoul 120-749, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    maskless photolithography; digital micromirror device (dmd); effective reflectance; diffraction efficiency; spot overlap; spot blur;

    机译：无掩模光刻;数字微镜器件（dmd）;有效反射率;衍射效率;斑点重叠;斑点模糊;

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