Synchrotron Radiation X-Ray Lithography for ULSI Fabrication

Kiyoshi FUJII; Shinji TSUBOI; Takuya YOSHIHARA; Yuusuke TANAKA; Katsumi SUZUKI; Masayuki HAMADA; Takaho TANIGAWA

首页> 外文期刊>NEC Research & Development >Synchrotron Radiation X-Ray Lithography for ULSI Fabrication

【24h】

Synchrotron Radiation X-Ray Lithography for ULSI Fabrication

机译：用于ULSI制造的同步辐射X射线光刻

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

To evaluate the applicability of Synchrotron Radiation X-Ray Lithography (SRXL) in ULSI manufacturing processes, we fabricated n-channel Metal-Oxide Semiconductor (MOS) transistors and 64 Mb DRAMs. Resist patterns with deep vertical side walls were replicated by SRXL. No radiation effect was observed in the initial device characteristics. Hot-electron-induced instability caused by x-ray irradiation in MOS transistors with thin gate oxides was annealed out by post-metallization annealing at 420℃. Improvement of overlay accuracy is the key issue for application of SRXL to future device fabrication.

机译：为了评估同步辐射X射线光刻（SRXL）在ULSI制造过程中的适用性，我们制造了n沟道金属氧化物半导体（MOS）晶体管和64 Mb DRAM。 SRXL复制了具有深垂直侧壁的抗蚀剂图案。在初始器件特性中未观察到辐射效应。通过420℃的后金属化退火退火了X射线辐照的MOS晶体管中的热电子诱导的不稳定性。覆盖精度的提高是将SRXL应用到未来设备制造中的关键问题。

著录项

来源
《NEC Research & Development》 |1996年第4期|p.432-440|共9页
作者
Kiyoshi FUJII; Shinji TSUBOI; Takuya YOSHIHARA; Yuusuke TANAKA; Katsumi SUZUKI; Masayuki HAMADA; Takaho TANIGAWA;
展开▼
作者单位

Microelectronics Research Laboratories;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类通信;
关键词
X-ray lithography; synchrotron radiation; overlay; DRAM; resist; hot carrier;

机译：X射线光刻;同步辐射;覆盖;DRAM;电阻;热载流子;

相似文献

外文文献
中文文献
专利

1. Fabrication of Mold Master for Spiral Microcoil Utilizing X-Ray Lithography of Synchrotron Radiation [J] . Harutaka MEKARU, Shinji KUSUMI, Noriaki SATO, Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2004,第6B期

机译：利用同步辐射的X射线光刻技术制造螺旋微线圈模具母模
2. Structural changes in poly(methyl methacrylate) during deep-etch X-ray synchrotron radiation lithography Part Ⅱ: Radiation effects on PMMA [J] . Olaf Schmalz, Michael Hess, Robert Kosfeld Die Angewandte Makromolekulare Chemie . 1996,第期

机译：深度腐蚀X射线同步加速器辐射光刻过程中聚甲基丙烯酸甲酯的结构变化第二部分：辐射对PMMA的影响
3. Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation [J] . Kyungjin Park, Kanghyun Kim, Seung Chul Lee, Materials . 2018,第8期

机译：使用简单尺寸变换通过同步X射线平版印刷术制备各种角度的聚合物微结构
4. Fabrication of X-ray Total Reflection Mirror Chip Using by Synchrotron Radiation Lithography [C] . Fumiki Kato, Utako Takagi, Masaki Koshiishi, Sensor Symposium on Sensors, Micromachines, and Applied Systems . 2008

机译：通过同步辐射光刻制造X射线总反射镜芯片的制造
5. The Local Bonding Environment of Amorphous Indium-Zinc-Oxygen Films Studied by X-ray Absorption Fine Structure and Total X-ray Scattering Using Synchrotron Radiation. [D] . Reese, Brandon J. 2011

机译：X射线吸收精细结构和同步辐射总X射线散射研究非晶铟锌氧薄膜的局部键合环境。
6. Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation [O] . Kyungjin Park, Kanghyun Kim, Seung Chul Lee, 2018

机译：使用简单尺寸变换通过同步X射线平版印刷术制备各种角度的聚合物微结构
7. Fabrication of a Dihedral Corner Reflector Array for a Floating Image Manufactured by X-ray Lithography Using Synchrotron Radiation [O] . Akinobu Yamaguchi, Satoshi Maekawa, Tomohisa Yamane, 2015

机译：使用同步辐射通过X射线光刻制造的浮动图像制造DiheDral角反射器阵列
8. Synchrotron radiation sources and condensers for projection x-ray lithography [R] . Murphy, J B, MacDowell, A A, White, D L, 1992

机译：用于投影x射线光刻的同步辐射源和聚光器

Synchrotron Radiation X-Ray Lithography for ULSI Fabrication

摘要

著录项

相似文献

相关主题

期刊订阅