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Effcts of Al_2O_3 films on the reliability of Au/Al joint

机译:Al_2O_3薄膜对Au / Al接头可靠性的影响

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摘要

Effects of Al_2O_3 films in the system of Au/Al joint widely used in semi- conductor devices at present have been studied. In the experiment, a thin film of Au/Al_2O_3/Al was used, and the diffusion of Au atoms across through Al_2O_3 films and the formation of intermetallic compound at tem- peratures between 25 deg C and 500 deg C were observed by using Auger electron spectroscopy, X-ray photoelectron spectroscopy, electric resistance mea- surement and secondary ion mass spectrometer with using ~18O as a tracer.
机译:研究了目前在半导体器件中广泛使用的Au / Al接头体系中Al_2O_3薄膜的影响。在实验中,使用了Au / Al_2O_3 / Al薄膜,并通过俄歇电子观察了Au原子在整个Al_2O_3薄膜中的扩散以及在25℃至500℃之间的金属间化合物的形成。质谱,X射线光电子能谱,电阻测量和二次离子质谱仪(使用〜18O作为示踪剂)。

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