In situ monitoring and controlling surface shape of the polishing pad in continuous polishing

著录项

• 来源
  《Optical engineering》 |2018年第7期|074103.1-074103.8|共8页
• 作者

  Jin Yin; Xiang Jiao; Wenlong Tang; Jianqiang Zhu;

  展开▼
• 作者单位

  Chinese Academy of Science, Shanghai Institute of Optics and Fine Mechanics, National Laboratory on High Power Laser and Physics, Shanghai, China,University of the Chinese Academy of Science, Beijing, China;

  Chinese Academy of Science, Shanghai Institute of Optics and Fine Mechanics, National Laboratory on High Power Laser and Physics, Shanghai, China;

  Chinese Academy of Science, Shanghai Institute of Optics and Fine Mechanics, National Laboratory on High Power Laser and Physics, Shanghai, China,University of the Chinese Academy of Science, Beijing, China;

  Chinese Academy of Science, Shanghai Institute of Optics and Fine Mechanics, National Laboratory on High Power Laser and Physics, Shanghai, China;

  展开▼
• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  continuous polishing; surface shape of polishing pad; in situ monitor and control;

  机译：连续抛光;抛光垫的表面形状;原位监控;