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Measurement of nanoscale displacements using a Mirau white-light interference microscope and an inclined flat surface

机译:使用Mirau白光干涉显微镜和倾斜平面测量纳米级位移

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摘要

Measuring nanoscale displacement is crucial for optical nanometrology. We report an approach to measure vertical nanoscale movements using a Mirau white-light interference microscope. Our technique is different compared with conventional methods. The vertical nanoscale displacement is determined by analyzing interference patterns in the x direction (instead of common z direction) via an inclined surface, which reduces the processing time. By analyzing the obtained interference images, which appear at two successive positions of an inclined flat surface, the maxima of interference signals and the tilt angle are determined. From these two parameters, the displacement is calculated. Using this approach, the transition of several tens of nanometers can be measured. We experimentally investigate the movement of a piezoelectric transducer and the obtained result agrees well with that provided by the manufacturer. Our finding is highly beneficial for optical measurements and surface topography.
机译:测量纳米级位移对于光学纳米计量学至关重要。我们报告了一种使用Mirau白光干涉显微镜测量垂直纳米尺度运动的方法。与传统方法相比,我们的技术有所不同。通过经由倾斜表面分析x方向(而不是共同的z方向)上的干涉图案来确定垂直纳米级位移,这减少了处理时间。通过分析在倾斜的平坦表面的两个连续位置处出现的获得的干涉图像,确定干涉信号的最大值和倾斜角。根据这两个参数,计算出位移。使用这种方法,可以测量几十纳米的跃迁。我们通过实验研究了压电换能器的运动,获得的结果与制造商提供的结果非常吻合。我们的发现对光学测量和表面形貌非常有益。

著录项

  • 来源
    《Optical engineering》 |2019年第6期|064106.1-064106.6|共6页
  • 作者单位

    Le Quy Don Technical University, Department of Optical Devices, Hanoi, Vietnam;

    Le Quy Don Technical University, Department of Optical Devices, Hanoi, Vietnam;

    Le Quy Don Technical University, Department of Optical Devices, Hanoi, Vietnam;

    Le Quy Don Technical University, Department of Optical Devices, Hanoi, Vietnam;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    white-light interference; nano-displacement; interterogram analysis;

    机译:白光干扰;纳米位移交互图分析;

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