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Suppression of imaging crack caused by the gap between micromirrors in maskless lithography

机译：无掩模光刻中微镜之间的间隙引起的成像裂纹的抑制

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摘要

The digital micromirror device (DMD) is the key device in maskless lithography. However, because of the machinery manufacturing limit of DMDs, the gap between the micromirrors may destroy the continuity of the graphic. This work presents a simple way to fill the imaging crack by controlling the partial coherence factor σ of the light source. A crack can be regarded as the image of a dark space. By considering the resolving power for such cracks under partially coherent illumination, the images of such dark spaces can be covered, preventing them from being imaged on the substrate. By using mathematical derivations of the light intensity distribution exposed to the substrate, and by utilizing the diffraction effect induced by the finite aperture of the optical projection system, an appropriate σ value can be determined for eliminating the image of the crack in an actual scene. The numerical simulation results demonstrate that this method can ensure the continuity of the graphic at the critical partial coherence factor σc regardless of the shape of the target graphic.
机译：数字微镜器件（DMD）是无掩模光刻中的关键器件。但是，由于DMD的机械制造限制，微镜之间的间隙可能会破坏图形的连续性。这项工作提出了一种通过控制光源的部分相干因子σ来填充成像裂缝的简单方法。裂缝可以看作是黑暗空间的图像。通过考虑部分相干照明下此类裂纹的分辨能力，可以覆盖此类暗区的图像，从而防止它们在基板上成像。通过使用暴露于基板的光强度分布的数学推导，以及利用由光学投影系统的有限孔径引起的衍射效应，可以确定适当的σ值，以消除实际场景中的裂纹图像。数值模拟结果表明，无论目标图形的形状如何，该方法都可以确保在临界局部相干因子σc下图形的连续性。

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  • 来源
    《Optical engineering》 |2017年第10期|106102.1-106102.5|共5页
  • 作者

    Liang Liwen; Zhou Jinyun; Lei Liang; Wang Bo; Wang Qu; Wen Kunhua;

  • 作者单位

    Guangdong University of Technology, School of Physics and Optoelectronic Engineering, Guangzhou, China;

    Guangdong University of Technology, School of Physics and Optoelectronic Engineering, Guangzhou, China;

    Guangdong University of Technology, School of Physics and Optoelectronic Engineering, Guangzhou, China;

    Guangdong University of Technology, School of Physics and Optoelectronic Engineering, Guangzhou, China;

    Guangdong University of Technology, School of Physics and Optoelectronic Engineering, Guangzhou, China;

    Guangdong University of Technology, School of Physics and Optoelectronic Engineering, Guangzhou, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    digital micromirror device; gap; maskless lithography; partial coherent;

    机译：数字微镜设备;间隙;无掩模光刻部分相干;

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