...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Optical engineering >Path planning and parameter optimization of uniform removal in active feed polishing
【24h】

Path planning and parameter optimization of uniform removal in active feed polishing

机译：主动进给抛光中均匀去除的路径规划和参数优化

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

A high-quality ultrasmooth surface is demanded in short-wave optical systems. However, the existing polishing methods have difficulties meeting the requirement on spherical or aspheric surfaces. As a new kind of small tool polishing method, active feed polishing (AFP) could attain a surface roughness of less than 0.3 nm (RMS) on spherical elements, although AFP may magnify the residual figure error or mid-frequency error. The purpose of this work is to propose an effective algorithm to realize uniform removal of the surface in the processing. At first, the principle of the AFP and the mechanism of the polishing machine are introduced. In order to maintain the processed figure error, a variable pitch spiral path planning algorithm and the dwell time-solving model are proposed. For suppressing the possible mid-frequency error, the uniformity of the synthesis tool path, which is generated by an arbitrary point at the polishing tool bottom, is analyzed and evaluated, and the angular velocity ratio of the tool spinning motion to the revolution motion is optimized. Finally, an experiment is conducted on a convex spherical surface and an ultrasmooth surface is finally acquired. In conclusion, a high-quality ultrasmooth surface can be successfully obtained with little degradation of the figure and mid-frequency errors by the algorithm.
机译：在短波光学系统中需要高质量的超光滑表面。然而，现有的抛光方法难以满足球形或非球形表面的要求。作为一种新型的小工具抛光方法，主动进给抛光（AFP）可以在球形元件上获得小于0.3 nm（RMS）的表面粗糙度，尽管AFP可能会放大残余图形误差或中频误差。这项工作的目的是提出一种有效的算法，以实现加工过程中表面的均匀去除。首先，介绍了AFP的原理和抛光机的机理。为了保持加工后的图形误差，提出了变螺距螺旋路径规划算法和停留时间求解模型。为了抑制可能的中频误差，分析和评估由抛光工具底部的任意点产生的合成工具路径的均匀性，并且工具旋转运动与旋转运动的角速度比为优化。最后，在凸球形表面上进行了实验，最终获得了超光滑表面。总之，通过该算法，可以成功获得高质量的超光滑表面，并且图形和中频误差几乎不会降低。

著录项

  • 来源
    《Optical engineering》 |2015年第6期|065101.1-065101.8|共8页
  • 作者

    Jian Liu; Shaozhi Wang; Chunlei Zhang; Linghua Zhang; Huanan Chen;

  • 作者单位

    Chinese Academy of Science, Changchun Institute of Optics, Fine Mechanics and Physics, Engineering Research Center of Extreme Precision Optics, State Key Laboratory of Applied Optics, Changchun 130033, China;

    Chinese Academy of Science, Changchun Institute of Optics, Fine Mechanics and Physics, Engineering Research Center of Extreme Precision Optics, State Key Laboratory of Applied Optics, Changchun 130033, China;

    Chinese Academy of Science, Changchun Institute of Optics, Fine Mechanics and Physics, Engineering Research Center of Extreme Precision Optics, State Key Laboratory of Applied Optics, Changchun 130033, China;

    Chinese Academy of Science, Changchun Institute of Optics, Fine Mechanics and Physics, Engineering Research Center of Extreme Precision Optics, State Key Laboratory of Applied Optics, Changchun 130033, China;

    Chinese Academy of Science, Changchun Institute of Optics, Fine Mechanics and Physics, Engineering Research Center of Extreme Precision Optics, State Key Laboratory of Applied Optics, Changchun 130033, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ultrasmooth polishing; uniform removal; path planning; parameter optimization;

    机译：超光滑抛光;均匀去除;路径规划;参数优化;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号