On-the-fly writing of a long grating phase mask

Philipp Miiller; Yves Jourlin; Colette Veilias; Gerard Bernaud; Yannick Bourgin; Svetlen Tonchev; Olivier Dellea

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On-the-fly writing of a long grating phase mask

机译：快速写入长光栅相位掩模

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摘要

A method is demonstrated for writing long grating phase masks, which can be used for patterning large-area (square meter size) submicron-period gratings. The method consist of illuminating a small area transmission grating phase mask by a continous wave transverse-electric-polarized collimated laser beam under the -1st order Littrow mounting to define a high-contrast interferogram composed of fringes. By sliding a long photoresist-coated substrate under this small area phase mask, gratings of arbitrary length may be written, with grating lines oriented in the scan direction. The patterning of uninterrupted gratings with lengths exceeding 300 mm is demonstrated.

机译：演示了一种用于写入长光栅相位掩模的方法，该方法可用于对大面积（平方米大小）的亚微米周期光栅进行构图。该方法包括在-1阶Littrow支架下用连续波横向电偏振准直激光束照射小面积透射光栅相位掩模，以定义由条纹组成的高对比度干涉图。通过在该小面积相位掩模下滑动长的涂有光刻胶的基板，可以写入任意长度的光栅，其中光栅线的方向沿扫描方向。演示了长度超过300毫米的不间断光栅的图案。

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来源
《Optical engineering》 |2011年第3期|p.321-329|共9页
作者
Philipp Miiller; Yves Jourlin; Colette Veilias; Gerard Bernaud; Yannick Bourgin; Svetlen Tonchev; Olivier Dellea;
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作者单位

Université de Lyon CNRS, UMR5516 Laboratoire Hubert Curien Saint-Etienne, 42000 France;

Université de Lyon CNRS, UMR5516 Laboratoire Hubert Curien Saint-Etienne, 42000 France;

Université de Lyon CNRS, UMR5516 Laboratoire Hubert Curien Saint-Etienne, 42000 France;

Université de Lyon CNRS, UMR5516 Laboratoire Hubert Curien Saint-Etienne, 42000 France;

Université de Lyon CNRS, UMR5516 Laboratoire Hubert Curien Saint-Etienne, 42000 France;

Université de Lyon CNRS, UMR5516 Laboratoire Hubert Curien Saint-Etienne, 42000 France;

CEA LITENDépartement des Technologies des NanoMatériaux Laboratoire des Technologies des Surfaces Saint Etienne, 42000 France;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种 eng
中图分类
关键词
gratings; phase masks: interference; lithography; nanotechnoloqy.;

机译：光栅;相位掩模：干扰;光刻纳米技术。;

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专利

1. Three-grating monolithic phase-mask for the single-order writing of large-period gratings [J] . Y. Bourgin, I. Vartiainen, Y. Jourlin, JEOS:RP . 2011,第23期

机译：三光栅单片相位掩模，用于大周期光栅的单次写入
2. Analysis on the effect of UV beam intensity profile on the refractive index modulation in phase mask based fiber Bragg grating writing [J] . R. Mahakud, O. Prakash, J. Kumar, Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter . 2012,第24期

机译：紫外光强度分布对相位掩模光纤布拉格光栅写入过程中折射率调制的影响分析
3. Tunable Writing Tm-Doped Intracore Fiber Bragg Gratings Using 800 nm Femtosecond Laser and Phase Mask [J] . Jing T, Zhang YJ Laser Physics: An International Journal devoted to Theoretical and Experimental Laser Research and Application . 2010,第1期

机译：使用800 nm飞秒激光和相位掩膜的可调谐写入Tm掺杂的内核内光纤布拉格光栅
4. Three-grating monolithic phase-mask for the single-order writing oflarge-period gratings [C] . Y. Bourgin, Y. Jourlin, M. Kuittinen, EOS topical meeting on diffractive optics . 2011

机译：三光栅单片相位掩模，用于单次写入大周期光栅
5. Ultrafast infrared laser fabrication of fibre Bragg gratings with a phase mask. [D] . Smelser, Christopher W. 2007

机译：具有相位掩模的光纤布拉格光栅的超快红外激光制造。
6. Experimental Analysis of Bragg Reflection Peak Splitting in Gratings Fabricated Using a Multiple Order Phase Mask [O] . Gabriela Statkiewicz-Barabach, Karol Tarnowski, Dominik Kowal, 2019

机译：多阶相位掩模在光栅中布拉格反射峰分裂的实验分析
7. Moving fibre/phase mask-scanning beam technique for writing arbitrary profile fibre gratings with a uniform phase mask [O] . Cole M.J., Loh W.H., Laming R.I., 1995

机译：移动光纤/相位掩模扫描光束技术，用于写入具有均匀相位掩模的任意轮廓光纤光栅

On-the-fly writing of a long grating phase mask

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