Reduction of residual stress in optical silicon nitcide thin films prepared by radio-frequency ion beam sputtering deposition

著录项

• 来源
  《Optical Engineering》 |2010年第6期|p.1-7|共7页
• 作者

  Cheng-Chung Lee fellow spie and Kun-Hsien Lee Chien-Jen Tang and Cheng-Chung JaingHsi-Chao Chen;

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• 作者单位

  National Central University, Department of Optics and Photonics, Thin Film Technology Center, Chung-Li 32001 Taiwan Minghsin University of Science and Technology, Department of Optoelectronic System Engineering, Optoelectronics Technology Research Center, Hsin-Chu 304 Taiwan National Yunlin University of Science and Technology, Graduate School of Optoelectronics, Yunlin 64002 Taiwan;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  internal stresses, ion beams, sputter deposition, residual stress, SiNx, radio-frequency ion-beam sputtering deposition, optical properties, interface stress;

  机译：内部应力;离子束;溅射沉积;残余应力;SiNx;射频离子束溅射沉积;光学性能;界面应力;