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首页> 外文期刊>Optical Materials >Optical and electrical properties of NiO and Cu-doped NiO thin films synthesized by spray pyrolysis
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Optical and electrical properties of NiO and Cu-doped NiO thin films synthesized by spray pyrolysis

机译：通过喷雾热解合成的NiO和Cu掺杂NiO薄膜的光学和电性能

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Spray pyrolysis technique was employed to synthesize NiO and NiO:Cu thin films (0.1-25% Cu) on soda-lime glass substrate. Optical properties, as well as electrical resistivity of these films, were investigated. UV-Visible spectrophotometer was employed to measure the optical properties. The absorption edge of the films was located within the UV range i.e. lambda = 280-380 nm. The average reflectance of the films was 16.9% in the range lambda = 280-900 nm. On increasing the Cu/Ni ratio, the optical band gap decreased whereas the refractive index and Urbach energy increased. Quantitatively, the measured average value of the refractive index and the value calculated from the Reddy-Ahammed empirical formula, which connects refractive index with optical band gap, were in good agreement. Optical conductivity was found to be in the range 10(14)-10(15) s(-1) while the dielectric loss was rather very low; it points to the good optical response of the films. The average oscillator energy as well as dispersion energy evaluated from Wemple-DiDomenico model decreased rapidly to begin with as Cu/Ni ratio was increased up to 5% but later on decreased rather slowly. Optical band gap values calculated by the Wemple-DiDomenico model and by Tauc relation agreed very well. The PL spectra of all the films displayed an intense peak at 403 nm and two secondary peaks at 426 nm and 365 nm. The PL intensity of each peak decreased monotonically with an increase in Cu content in NiO:Cu thin film from 0 to 3%. However, it remained almost independent of Cu content in the range of 4-25%. With an increase in Cu/Ni ratio, electrical resistivity and carrier mobility decreased whereas carrier concentration increased.
机译：使用喷雾热解技术在钠钙玻璃基板上合成NiO和NiO：Cu薄膜（0.1-25％Cu）。研究了光学性质，以及这些薄膜的电阻率。采用UV可见分光光度计测量光学性质。薄膜的吸收边缘位于UV范围内，即Lambda = 280-380nm。薄膜的平均反射率在Lambda = 280-900nm的范围内为16.9％。在增加Cu / Ni比率时，光带间隙降低，而折射率和URBACH能量增加。定量地，从折射率与光带间隙连接折射率的折射率的测量平均值和从折射率连接的折射率计算的值良好。发现光导率在10（14）-10（15）S（-1）范围内，而介电损耗相当低;它指向薄膜的良好光学响应。从Wemple-Didomenico模型评价的平均振荡能量以及分散能量迅速降低，因为Cu / Ni比率增加到5％，但后来慢慢降低。由Wemple-Didomenico模型和Tauc关系计算的光带隙值非常吻合。所有薄膜的PL光谱在403nm和426nm和365nm的403nm和两个次级峰处显示出强烈峰。每个峰的PL强度单调地随着NIO中的Cu含量的增加而下调：Cu薄膜为0至3％。然而，它几乎独立于4-25％的Cu含量。随着Cu / Ni比的增加，电阻率和载流子迁移率降低而载流子浓度增加。

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