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Long-lived excitons in GaN/AlN nanowire heterostructures

机译:GaN / AlN纳米线异质结构中的长寿命激子

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摘要

GaN/AlN nanowire heterostructures can display photoluminescence (PL) decay times on the order of microseconds that persist up to room temperature. Doping the GaN nanodisk insertions with Ge can reduce these PL decay times by two orders of magnitude. These phenomena are explained by the three-dimensional electric field distribution within the GaN nanodisks, which has an axial component in the range of a few MV/cm associated to the spontaneous and piezoelectric polarization, and a radial piezoelectric contribution associated to the shear components of the lattice strain. At low dopant concentrations, a large electron-hole separation in both the axial and radial directions is present. The relatively weak radial electric fields, which are about one order of magnitude smaller than the axial fields, are rapidly screened by doping. This bidirectional screening leads to a radial and axial centralization of the hole underneath the electron, and consequently, to large decreases in PL decay times, in addition to luminescence blue shifts.
机译:GaN / AlN纳米线异质结构可以显示微秒级的光致发光(PL)衰减时间,该时间持续到室温。用Ge掺杂GaN纳米盘插入物可以将这些PL衰减时间减少两个数量级。这些现象可以通过GaN纳米盘内的三维电场分布来解释,该电场具有与自发极化和压电极化相关的几个MV / cm范围内的轴向分量,以及与GaN剪切分量相关的径向压电上的贡献。晶格应变。在低掺杂剂浓度下,在轴向和径向上都存在较大的电子-空穴间隔。通过掺杂快速屏蔽了相对弱的径向电场,该径向电场比轴向电场小大约一个数量级。这种双向屏蔽导致电子下方的空穴在径向和轴向上居中,因此,除了发光蓝移之外,还导致PL衰减时间大大减少。

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  • 来源
    《Physical review》 |2015年第20期|205440.1-205440.8|共8页
  • 作者单位

    Universite Grenoble Alpes, 38000 Grenoble, France,CEA-Grenoble, INAC, SP2M-NPSC, 17 av. des Martyrs, 38054 Grenoble, France;

    Universite Grenoble Alpes, 38000 Grenoble, France,CEA-Grenoble, INAC, SP2M-NPSC, 17 av. des Martyrs, 38054 Grenoble, France;

    I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 16, D-35392 Giessen, Germany;

    Universite Grenoble Alpes, 38000 Grenoble, France,CEA-Grenoble, INAC, SP2M-NPSC, 17 av. des Martyrs, 38054 Grenoble, France;

    I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 16, D-35392 Giessen, Germany;

    Institut de Ciencia de Materials de Barcelona, ICMAB-CSIC, Campus UAB, 08193 Barcelona, Catalonia, Spain;

    Institut de Ciencia de Materials de Barcelona, ICMAB-CSIC, Campus UAB, 08193 Barcelona, Catalonia, Spain,ICREA and lnstitut Catala de Nanociencia i Nanotecnologia (ICN2), 08193 Barcelona, Catalonia, Spain;

    I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 16, D-35392 Giessen, Germany;

    Universite Grenoble Alpes, 38000 Grenoble, France,CEA-Grenoble, INAC, SP2M-NPSC, 17 av. des Martyrs, 38054 Grenoble, France;

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  • 正文语种 eng
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  • 关键词

    Ⅱ-Ⅵ semiconductors; electron states and collective excitations in multilayers, quantum wells, mesoscopic, and nanoscale systems;

    机译:Ⅱ-Ⅵ半导体;多层;量子阱;介观和纳米级系统中的电子态和集体激发;

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