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Silicon cleaning and defect passivation effects of hydrogen cyanide aqueous solutions

机译：氰化氢水溶液的硅清洗和缺陷钝化效果

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Hydrogen cyanide (HCN) aqueous solutions are found to possess a great ability of removal of copper contaminants on Si as well as a Si defect passivation effect. Copper (Cu) contaminants of 10~(13) cm~(-2) order concentrations can be reduced below 3 X 10~9 cm~(-2) taking only 10 s even at room temperature when the pH of the HCN aqueous solution is set at 10. The cleaning ability of HCN solutions increases with pH, indicating that cyanide ions are the reaction species with Cu contaminants. Even when HCN solutions are contaminated with 64 ppm Cu~(2+) ions, the cleaning ability is unchanged, indicating avoidance of re-adsorption. Ultraviolet absorption spectra show that after the cleaning, Cu-cyanide complexes are formed in the HCN solutions. The main Cu species in the HCN solutions are Cu(CN)_3~(2-), and due to its stability, re-adsorption does not occur. When SiO_2/Si structure is immersed in the HCN aqueous solutions for 24 h, the SiO_2 thickness is unchanged at all, showing that etching does not occur during the cleaning process. The energy conversion efficiency of pn-junction Si solar cells with a spherical shape is increased to 1.07-1.48 times by immersion in the HCN aqueous solutions, and the improvement is attributed to passivation of defect states in Si by cyanide ions.
机译：已发现氰化氢（HCN）水溶液具有很大的去除Si上铜污染物的能力以及Si缺陷钝化效果。 HCN水溶液的pH值即使在室温下也只需10 s即可将10〜（13）cm〜（-2）级浓度的铜（Cu）污染物减少到3 X 10〜9 cm〜（-2）以下HCN溶液的清洁能力随pH的增加而提高，这表明氰化物离子是与Cu污染物发生反应的物质。即使当HCN溶液被64 ppm Cu〜（2+）离子污染时，清洁能力也不会改变，这表明可以避免再次吸附。紫外线吸收光谱表明，清洗后，HCN溶液中形成了氰化铜络合物。 HCN溶液中的主要Cu种类为Cu（CN）_3〜（2-），由于其稳定性，不会发生再吸附。将SiO_2 / Si结构在HCN水溶液中浸泡24小时后，SiO_2的厚度完全不变，表明在清洁过程中不会发生蚀刻。通过浸入HCN水溶液中，球形pn结硅太阳能电池的能量转换效率提高到1.07-1.48倍，并且这种改善归因于氰化物离子使硅中的缺陷态钝化。

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