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首页> 外文期刊>Solid-State Electronics >Effect of load current density during the production of Cu_2O/Cu solar cells by anodic oxidation on film quality and output power
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Effect of load current density during the production of Cu_2O/Cu solar cells by anodic oxidation on film quality and output power

机译:阳极氧化制备Cu_2O / Cu太阳能电池过程中负载电流密度对薄膜质量和输出功率的影响

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摘要

In this paper, we demonstrate that improvements in the Cu_2O film quality and consequently the output power of Cu_2O/Cu solar cells can be achieved by decreasing the load current density used in production of the film by anodic oxidation. Cu_2O films were fabricated under various oxidizing condition in an aqueous solution of CuSO_4, NaCl and LiCl at a temperature of 86 ℃. The load current density and loading time were varied. The variations in the output power of the solar cells with film thickness and quality, determined by the electrical resistance, the amount of CuCl in the Cu_2O film, and the crystal quality and crystal grain size of the Cu_2O, were evaluated. From the maximum value of the output power, the best film thickness of the Cu_2O film was found to be about 8-10 μm. Moreover, Cu_2O films with lower electrical resistance, less CuCl, greater crystal quality and larger crystal grain size led to more powerful solar cells, i.e., higher output power. These Cu_2O films were obtained by decreasing the load current density used in fabrication. The highest output power achieved (with load current density = 1.25 mA/cm2, loading time = 8 h) was 702 nW.
机译:在本文中,我们证明可以通过降低阳极氧化膜生产中使用的负载电流密度来实现Cu_2O膜质量的改善,从而提高Cu_2O / Cu太阳能电池的输出功率。在CuSO_4,NaCl和LiCl的水溶液中于86℃下,在各种氧化条件下制备Cu_2O膜。负载电流密度和负载时间是变化的。评价了由电阻,Cu_2O膜中的CuCl的量以及Cu_2O的晶体质量和晶粒尺寸确定的太阳能电池的输出功率随膜厚度和质量的变化。从输出功率的最大值,发现Cu_2O膜的最佳膜厚度为约8-10μm。此外,具有更低电阻,更少CuCl,更大晶体质量和更大晶粒尺寸的Cu_2O膜导致更强大的太阳能电池,即更高的输出功率。这些Cu_2O膜是通过降低制造中使用的负载电流密度而获得的。达到的最高输出功率(负载电流密度= 1.25 mA / cm2,负载时间= 8 h)为702 nW。

著录项

  • 来源
    《Solid-State Electronics》 |2014年第1期|130-136|共7页
  • 作者单位

    Department of Nanomechanics, Tohoku University, Aoba 6-6-01, Aramaki, Aoba-ku, Sendai 980-8579, Japan;

    Department of Nanomechanics, Tohoku University, Aoba 6-6-01, Aramaki, Aoba-ku, Sendai 980-8579, Japan;

    Department of Nanomechanics, Tohoku University, Aoba 6-6-01, Aramaki, Aoba-ku, Sendai 980-8579, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Cuprous oxide; Schottky junction; Copper(Ⅰ) chloride; Anodic oxidation; Film quality; Crystal grain;

    机译:氧化亚铜;肖特基结;氯化铜阳极氧化;电影质量;晶粒;

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