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首页> 外文期刊>Thin Solid Films >Effect of N_2 flow rate on structural and infrared properties of multi-layer AlCrN/Cr/AlCrN coatings deposited by cathodic arc ion plating for low emissivity applications
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Effect of N_2 flow rate on structural and infrared properties of multi-layer AlCrN/Cr/AlCrN coatings deposited by cathodic arc ion plating for low emissivity applications

机译：N_2流量对低发射率应用阴极电弧离子镀多层AlCrN / Cr / AlCrN多层涂层结构和红外性能的影响

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摘要

The effect of N-2 flow rate on structural, composition, deposition rate, electrical and infrared properties of the multi-layer AlCrN/Cr/AlCrN tandem coatings have been studied. The coatings were designed and prepared by a cathodic arc ion plating system at various N-2 flow rates for low emissivity applications. The results showed that the thickness of AlCrN layers decreased continuously with increasing N-2 flow rate. Structure and elemental composition of the deposited coatings strongly depended on N-2 flow rate. X-ray diffraction analysis showed that for 10-80 sccm, the coatings exhibited a single (fcc) phase, for 120-160 sccm, an amorphous phase was obtained. The phase formation has been confirmed by transmission electron microscopy diffraction patterns. As for electrical resistivity, the AlCrN layers turned from conductive, semiconductive, to dielectric behavior. In practice for low emissivity applications, the deposited multi-layer coatings exhibited emissivity values among 0.0748-0.1193, which rose with increased N-2 flow rate. Among all the phases, the coating with an amorphous AlCrN layer (160 sccm) presented an outstanding thermal stability and had an emissivity of 0.1194 even after annealing at 800 degrees C for 10 h in air. It was observed that the amorphous AlCrN layer effectively controlled the inward diffusion of O and the outward diffusion of Cr, Al and Ni from substrate, which rendered this multi-layer coating a potential material for low emissivity applications at high temperature.
机译：研究了N-2流量对多层AlCrN / Cr / AlCrN串联涂层的结构，组成，沉积速率，电学和红外性能的影响。该涂层是通过阴极电弧离子镀系统在各种N-2流速下设计和制备的，用于低发射率应用。结果表明，随着N-2流量的增加，AlCrN层的厚度不断减小。沉积涂层的结构和元素组成很大程度上取决于N-2流速。 X射线衍射分析表明，对于10-80sccm，涂层表现出单相（fcc），对于120-160sccm，获得非晶态。通过透射电子显微镜衍射图证实了相的形成。至于电阻率，AlCrN层从导电，半导电转变为介电行为。在实践中，对于低发射率应用，沉积的多层涂层的发射率值介于0.0748-0.1193之间，随着N-2流量的增加而上升。在所有相中，即使在空气中在800摄氏度下退火10小时后，具有非晶AlCrN层（160 sccm）的涂层仍具有出色的热稳定性，并且发射率仅为0.1194。观察到非晶AlCrN层有效地控制了O向内的扩散以及Cr，Al和Ni从基体的向外扩散，这使得该多层涂层成为高温下低发射率应用的潜在材料。

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