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Optical properties of highly stable silver thin films using different surface metal layers

机译：使用不同表面金属层的高度稳定的银薄膜的光学特性

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Previously, we developed a highly stable silver thin film where surface and interface Al nanolayers were used to suppress agglomeration by annealing. In this study, we focus on reflectance of the silver film. The Al and Ti surface layers were deposited on silver films by RF magnetron sputtering. The surface morphology and reflectance of Ag, Al/Ag and Ti/Ag films were measured using an atomic force microscope and a spectrophotometer, respectively. It is found that the surface roughness of all the films is very small and it decreased by deposition of Al and Ti layers. We found 1-nm-thick Al or Ti layer deposited Ag films showed the same reflectance as silver single film. But a decrease of the reflectance was observed when the thickness of the Al or Ti layer was increased to 3 nm. Consequently, it is found that the optimum thickness of Al or Ti layer deposition is 1 nm in highly stable silver thin films. Their optical properties were influenced by both metal and metal oxide of the surface layer.
机译：以前，我们开发了一种高度稳定的银薄膜，其中表面和界面的Al纳米层用于通过退火抑制结块。在这项研究中，我们专注于银膜的反射率。通过RF磁控溅射将Al和Ti表面层沉积在银膜上。使用原子力显微镜和分光光度计分别测量了Ag，Al / Ag和Ti / Ag膜的表面形貌和反射率。发现所有膜的表面粗糙度都非常小，并且由于沉积了Al和Ti层而降低了。我们发现，厚度为1纳米的Al或Ti层沉积的Ag膜显示出与银单膜相同的反射率。但是，当Al或Ti层的厚度增加到3 nm时，反射率会降低。因此，发现在高度稳定的银薄膜中，Al或Ti层沉积的最佳厚度为1 nm。它们的光学性质受表面层的金属和金属氧化物的影响。

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