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首页> 外文期刊>Thin Solid Films >Optical properties of diamond like carbon films containing copper, grown by high power pulsed magnetron sputtering and direct current magnetron sputtering: Structure and composition effects
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Optical properties of diamond like carbon films containing copper, grown by high power pulsed magnetron sputtering and direct current magnetron sputtering: Structure and composition effects

机译：通过大功率脉冲磁控溅射和直流磁控溅射生长的含铜的类金刚石碳膜的光学性质：结构和组成效应

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摘要

In the present study chemical composition, structure and optical properties of hydrogenated diamond like carbon films containing copper (DLC: Cu films) deposited by reactive magnetron sputtering were studied. Different modes of deposition -direct current (DC) sputtering and high power pulsed magnetron sputtering (HIPIMS) as well as two configurations of the magnetron magnetic field (balanced and unbalanced) were applied. X-ray diffractometry, Raman scattering spectroscopy, energy-dispersive X-ray spectroscopy and atomic force microscopy were used to study the structure and composition of the films. It was shown that by using HIPIMS mode contamination of the cathode during the deposition of DLC:Cu films can be suppressed. In all cases oxygen atomic concentration in the films was in 5-10 at.% range and it increased with the copper atomic concentration. The highest oxygen content was observed in the films deposited employing low ioneutral ratio balanced DC magnetron sputtering process. According to the analysis of the parameters of Raman scattering spectra, sp(3)/sp(2) bond ratio decreasedwith the increase of Cu atomic concentration in the DLC films. Clear dependence of the extinction, absorbance and reflectance spectra on copper atomic concentration in the films was observed independently of themethod of deposition. Surface plasmon resonance effectwas observed onlywhen Cu atomic concentration in DLC:Cu filmwas at least 15 at.%. The maximumof the surface plasmon resonance peak of the absorbance spectra of DLC:Cu films was in 600-700 nmrange and redshifted with the increase of Cu amount. The ratio between the intensities of the plasmonic peak and hydrogenated amorphous carbon related peak at similar to 220 nm both in the extinction and absorbance spectra as well as peak to background ratio of DLC:Cu films increased linearly with Cu amount in the investigated 0-40 at.% range. Reflectance of the plasmonic DLC:Cu films was in 30-50% range that could be important in practical optical applications of DLC:Cu films. (C) 2014 Elsevier B.V. All rights reserved.
机译：在本研究中，研究了通过反应磁控溅射沉积的含铜的氢化金刚石状碳膜（DLC：Cu膜）的化学组成，结构和光学性质。应用了不同的沉积方式-直流（DC）溅射和高功率脉冲磁控溅射（HIPIMS）以及磁控管磁场的两种配置（平衡和不平衡）。 X射线衍射，拉曼散射光谱，能量色散X射线光谱和原子力显微镜被用来研究薄膜的结构和组成。结果表明，通过使用HIPIMS模式，可以抑制DLC：Cu膜沉积过程中阴极的污染。在所有情况下，膜中的氧原子浓度在5-10 at。％的范围内，并且随铜原子浓度的增加而增加。在采用低离子/中性比平衡直流磁控溅射工艺沉积的薄膜中观察到了最高的氧含量。根据拉曼散射光谱参数的分析，随着D​​LC薄膜中Cu原子浓度的增加，sp（3）/ sp（2）的键合比降低。观察到消光，吸收光谱和反射光谱对薄膜中铜原子浓度的明显依赖性，与沉积方法无关。仅当DLC：Cu膜中的Cu原子浓度至少为15 at。％时，才观察到表面等离子体共振效应。 DLC：Cu薄膜的吸收光谱的表面等离子体共振峰的最大值在600-700 nm范围内，并且随着Cu含量的增加而发生红移。在消光和吸收光谱中，类似于220 nm的等离激元峰和氢化非晶态碳相关峰的强度比以及DLC：Cu膜的峰背景比随Cu量线性增加在研究的0-40中at。％范围。等离子DLC：Cu膜的反射率在30-50％的范围内，这可能对DLC：Cu膜的实际光学应用很重要。 （C）2014 Elsevier B.V.保留所有权利。

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