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Surface modification of materials by dielectric barrier discharge deposition of fluorocarbon films

机译：通过电介质阻挡放电沉积碳氟化合物薄膜对材料进行表面改性

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摘要

Dielectric barrier discharges have been used to deposit fluorocarbon (FC) films on various materials, such as paper, glass, and silicon substrates. The primary monomers used for plasma polymerization were difluoromethane (CH_2F_2), octafluoropropane (C_3F_8), and octafluorocyclobutane (C_4F_8). FC films were characterized using Fourier transform infrared spectroscopy, atomic force microscopy, static contact angle measurements, and scanning electron microscopy. Surface and structural properties of deposited films are strongly dependent on the plasma compositions and plasma parameters. FC films deposited on paper are to enhance its barrier properties and to achieve hydrophobic surfaces. Contact angle studies reveal that a minimum FC film thickness of about 200 nm on paper is required to completely cover surface and near-surface fibers, thereby providing the paper with long term hydrophobic character. In the C_3F_8 and C_4F_8 systems, the contact angles of the deposited films do not change appreciably with plasma parameters and are strongly dependent on the substrate roughness. Hydrogenated FC films deposited with CH_2F_2 plasmas show the relatively low contact angles due to the existence of CH_X (x = 1-3) groups.
机译：介电势垒放电已用于在各种材料（例如纸张，玻璃和硅衬底）上沉积碳氟化合物（FC）膜。用于等离子体聚合的主要单体是二氟甲烷（CH_2F_2），八氟丙烷（C_3F_8）和八氟环丁烷（C_4F_8）。使用傅里叶变换红外光谱，原子力显微镜，静态接触角测量和扫描电子显微镜对FC膜进行表征。沉积膜的表面和结构性质在很大程度上取决于等离子体组成和等离子体参数。沉积在纸上的FC膜将增强其阻隔性能并获得疏水性表面。接触角研究表明，要完全覆盖表面和近表面纤维，纸张上的最小FC膜厚度约为200 nm，从而使纸张具有长期疏水性。在C_3F_8和C_4F_8系统中，沉积膜的接触角不会随等离子体参数而明显变化，并且很大程度上取决于基板的粗糙度。由于存在CH_X（x = 1-3）基团，因此用CH_2F_2等离子体沉积的氢化FC薄膜显示出相对较低的接触角。

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  • 来源
    《Thin Solid Films》 |2009年第13期|3656-3660|共5页
  • 作者

    Dongping Liu; Yejun Yin; Dongming Li; Jinhai Niu; Zhixing Feng;

  • 作者单位

    School of Science, Dalian Nationalities University, Dalian 116600, China;

    School of Science, Dalian Nationalities University, Dalian 116600, China School of Mechanical Engineering, Dalian Jiaotong University, Dalian 116021, China;

    School of Mechanical Engineering, Dalian Jiaotong University, Dalian 116021, China;

    School of Science, Dalian Nationalities University, Dalian 116600, China;

    School of Science, Dalian Nationalities University, Dalian 116600, China;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    dielectric barrier discharge; fluorocarbon films; plasma deposition;

    机译：介质阻挡放电;碳氟化合物薄膜;等离子体沉积;

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