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首页> 外文期刊>Thin Solid Films >Coalescence of magnetron-sputtered silver islands affected by transition metal seeding (Ni, Cr, Nb, Zr, Mo, W, Ta) and other parameters
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Coalescence of magnetron-sputtered silver islands affected by transition metal seeding (Ni, Cr, Nb, Zr, Mo, W, Ta) and other parameters

机译:受过渡金属种子(Ni,Cr,Nb,Zr,Mo,W,Ta)和其他参数影响的磁控溅射银岛的聚结

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摘要

Silver thin films were deposited on various base layers using magnetron sputtering. The onset of coalescence of silver islands was evaluated using in situ conductivity measurements. The substrates included glass and silicon, with base layers of ZnO:Al 4 at.% at various thickness and additional thin seed layers of transition metals. It is shown that certain conditions promote coalescence, and in particular the following seed conditions: tungsten (1.0 nm), molybdenum (0.1 nm), zirconium (0.5 nm), and nickel (0.1-0.2 nm). In the absence of transition metal seeding, earlier onset of coalescence occurred at the thinnest of the ZnO:Al 4 at.% base layers (5 nm) and the lowest sputtering power (50 W), indicating that the substrate-film system is not in thermodynamic equilibrium.
机译:使用磁控溅射将银薄膜沉积在各种基础层上。使用原位电导率测量来评估银岛的聚结开始时间。基板包括玻璃和硅,具有各种厚度的ZnO:Al 4 at。%的基础层和过渡金属的其他薄籽晶层。结果表明,某些条件会促进聚结,特别是以下晶种条件:钨(1.0 nm),钼(0.1 nm),锆(0.5 nm)和镍(0.1-0.2 nm)。在没有过渡金属晶种的情况下,较早的聚结发生在最薄的ZnO:Al 4 at。%基层(5 nm)和最低的溅射功率(50 W)下,这表明衬底-薄膜系统不是在热力学平衡中。

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