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Opto-electronic properties of rough LP-CVD ZnO:B for use as TCO in thin-film silicon solar cells

机译:在薄膜硅太阳能电池中用作TCO的粗糙LP-CVD ZnO:B的光电性能

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摘要

Polycrystalline Boron-doped ZnO films deposited by low pressure chemical vapor deposition technique are developed for their use as transparent contacts for thin-film silicon solar cells. The size of the columnar grains that constitute the ZnO films is related to their light scattering capability, which has a direct influence on the current generation in thin-film silicon solar cells. Furthermore, if the doping level of the ZnO films is kept below 1×10~(20) cm~(-3), the electron mobility can be drastically enhanced by growing large grains, and the free carrier absorption is reduced. All these considerations have been taken in account to develop ZnO films finely optimized for the fabrication of microcrystalline thin-film silicon solar cells. These TCO allow the achievement of solar cell conversion efficiencies close to 10%.
机译:通过低压化学气相沉积技术沉积的多晶掺硼ZnO薄膜被开发用作薄膜硅太阳能电池的透明触点。构成ZnO膜的柱状晶粒的尺寸与其光散射能力有关,这直接影响薄膜硅太阳能电池中的电流产生。此外,如果将ZnO膜的掺杂水平保持在1×10〜(20)cm〜(-3)以下,则通过生长大晶粒可以大大提高电子迁移率,并且自由载流子吸收降低。已经考虑了所有这些考虑,以开发为制造微晶薄膜硅太阳能电池而精细优化的ZnO膜。这些总拥有成本可实现接近10%的太阳能电池转换效率。

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