首页> 外文期刊>Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion >Rough ZnO layers by LP-CVD process and their effect in improving performances of amorphous and microcrystalline silicon solar cells
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Rough ZnO layers by LP-CVD process and their effect in improving performances of amorphous and microcrystalline silicon solar cells

机译:LP-CVD工艺制备的粗糙ZnO层及其对改善非晶和微晶硅太阳能电池性能的影响

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摘要

Doped ZnO layers deposited by low-pressure chemical vapour deposition technique have been studied for their use as transparent contact layers for thin-film silicon solar cells. Surface roughness of these ZnO layers is related to their light-scattering capability; this is shown to be of prime importance to enhance the current generation in thin-film silicon solar cells. Surface roughness has been tuned over a large range of values, by varying thickness and/or doping concentration of the ZnO layers. A method is proposed to optimize the light-scattering capacity of ZnO layers, and the incorporation of these layers as front transparent conductive oxides for p-i-n thin-film microcrystalline silicon solar cells is studied. (c) 2006 Elsevier B.V. All rights reserved.
机译:已经研究了通过低压化学气相沉积技术沉积的掺杂ZnO层作为薄膜硅太阳能电池的透明接触层的用途。这些ZnO层的表面粗糙度与其光散射能力有关。这对于提高薄膜硅太阳能电池的电流产生至关重要。通过改变ZnO层的厚度和/或掺杂浓度,可以在很大的范围内调整表面粗糙度。提出了一种优化ZnO层光散射能力的方法,并研究了这些层作为p-i-n薄膜微晶硅太阳能电池的正面透明导电氧化物的掺入。 (c)2006 Elsevier B.V.保留所有权利。

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