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Microstructuring of glassy carbon: comparison of laser machining and reactive ion etching

机译：玻碳的微结构化：激光加工与反应离子蚀刻的比较

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Structuring of glassy carbon (GC) can be performed by various methods such as sawing, laser ablation, and reactive ion etching (RIE). Laser machining with a tripled Nd:YAG laser at an irradiation wavelength of 355 nm allows the fabrication of V-shaped channels with depths >600 μm and aspect ratios >5. This method is very flexible for rapid prototyping, but is comparatively slow due to the sequential machining. A complete flowfield consisting of 100 parallel channels with a depth of 250 μm and a top width of 50 μm was prepared by direct laser ablation and tested in a micro fuel cell. As an alternative, a novel process combining laser structuring of a metal mask with subsequent reactive ion etching was developed. The quality of the metal layer and the ablation behavior are strongly influenced by the metal adhesion, which depends on the GC pretreatment and the deposition technique. Reactive ion etching of glassy carbon can be performed with etch rates of ≈40 μm h~(-1), but the high pressure conditions of 100 mTorr (0.13 mbar) limit the aspect ratio to < 1.5 due to pronounced underetching. The fabrication of structures with aspect ratios >4 and etch rates of ≈10 μm h~(-1) is possible with the use of alternative etching devices with different design or plasma sources.
机译：可以通过诸如锯，激光烧蚀和反应离子蚀刻（RIE）的各种方法来进行玻璃碳（GC）的结构化。使用三重Nd：YAG激光器以355 nm的照射波长进行激光加工，可以制造深度> 600μm和纵横比> 5的V形通道。该方法对于快速成型非常灵活，但由于顺序加工而相对较慢。通过直接激光烧蚀制备了由100个平行通道组成的完整流场，深度为250μm，顶部宽度为50μm，并在微型燃料电池中进行了测试。作为替代方案，开发了一种结合金属掩模的激光结构化和随后的反应性离子蚀刻的新颖工艺。金属层的质量和烧蚀行为受到金属附着力的强烈影响，这取决于GC预处理和沉积技术。可以用≈40μmh〜（-1）的蚀刻速率执行玻璃碳的反应性离子蚀刻，但是由于明显的欠蚀刻，100 mTorr（0.13 mbar）的高压条件将纵横比限制为<1.5。通过使用具有不同设计或等离子源的替代蚀刻设备，可以制造纵横比> 4且蚀刻速率约为10μmh〜（-1）的结构。

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