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Simulation of a stress-strain state in thin structured gallium nitride films on sapphire substrates

机译:蓝宝石衬底上结构化氮化镓薄膜中应力-应变状态的模拟

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摘要

The stress-strain state in thin structured gallium nitride films on sapphire substrates containing open pores has been simulated. The results have been obtained by the finite element method in the commercial program complex. The stress intensity factor K_I has been calculated for the model considering a crack at the GaN/sapphire interface near an open pore. Based on the calculations of elastic fields, the redistribution of stresses by a structure with an ordered array of open pores in gallium nitride films has been estimated.
机译:模拟了蓝宝石衬底上含有开放孔的氮化镓薄膜的应力应变状态。结果已通过商业程序组合中的有限元方法获得。考虑到在开孔附近的GaN /蓝宝石界面处的裂纹,已经为模型计算了应力强度因子K_I。基于弹性场的计算,已经估计了氮化镓膜中具有规则排列的开孔阵列的结构所引起的应力重新分布。

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