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首页> 外文期刊>Plasma physics and controlled fusion >The physics of plasma-enhanced chemical vapour deposition for large-area coating: industrial application to flat panel displays and solar cells
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The physics of plasma-enhanced chemical vapour deposition for large-area coating: industrial application to flat panel displays and solar cells

机译：用于大面积涂层的等离子增强化学气相沉积的物理学：工业应用在平板显示器和太阳能电池上

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Designing plasma-enhanced chemical vapour deposition (PECVD) reactors to coat large-area glass plates (similar to1 m(2)) for flat panel display or solar cell manufacturing raises challenging issues in physics and chemistry as well as mechanical, thermal, and electrical engineering, and material science. In such reactive glow discharge plasma slabs, excited at RF frequency (from 13.56 MHz up to similar to 100 MHz), the thin-film deposition uniformity is determined by the gas flow distribution, as well as the RF voltage distribution along the electrodes, and by local plasma perturbations at the reactor boundaries. All these aspects can be approached by analytical and numerical modelling. Moreover, the film properties are largely determined by the plasma chemistry involving the neutral radicals contributing to film growth, the effect of ion bombardment, and the formation and trapping of dust triggered by homogeneous nucleation. This paper will review progress in this field, with particular emphasis on modelling developments. [References: 25]
机译：设计用于平板显示器或太阳能电池制造的大面积玻璃板（类似于1 m（2））涂层的等离子体增强化学气相沉积（PECVD）反应器在物理和化学以及机械，热和电方面提出了具有挑战性的问题工程和材料科学。在这种反应性辉光放电等离子体平板中，以射频频率（从13.56 MHz直至接近100 MHz）激发，薄膜沉积的均匀性取决于气流分布以及沿电极的射频电压分布，并且通过反应堆边界处的局部等离子体扰动。所有这些方面都可以通过分析和数值建模来解决。此外，膜的性能在很大程度上由等离子体化学决定，该化学涉及中性基团，该中性基团有助于膜的生长，离子轰击的作用以及由均匀成核引起的粉尘的形成和捕获。本文将回顾该领域的进展，特别强调建模的发展。 [参考：25]

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