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首页> 外文期刊>Polymers for advanced technologies >Fabrication of buried waveguide microstructure using gas-assisted microanoimprinting with soft mold
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Fabrication of buried waveguide microstructure using gas-assisted microanoimprinting with soft mold

机译：气体辅助的微模/纳米压印与软模制造隐埋波导微结构

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摘要

Due to the limitations on the choice of wavelengths available for light source, nanograde structures are facing technological bottlenecks and their method of preparation using current lithography and imaging technology is extremely costly. The idea is thus born to develop a nanopressuring and manufacturing technology, in order to further develop a low-cost and more reliable technology to manufacture nanodevices in full scale. This study combines the characteristics of soft lithography, photo-resist, and gas-assisted pressuring, as well as studies the use of gas-assisted pressuring and soft mold to emboss photo-resist to manufacture optical waveguide devices, such that the nanopressuring technology may be more mature. Study results show that polydimethylsiloxane (PDMS) is able to accurately emboss and replicate nanograde buried waveguide structures, by using even pressure gas to achieve full contact with the surface of the substrate thus greatly increasing the effective pressuring area. Also, PDMS soft molds are easier to make with short embossing time to effectively reduce cost. Another advantage of combining gas-assisted pressuring with PDMS soft molds in the manufacturing process is that PDMS soft molds possess low free energy on the surface and are difficult for resist to adhere.
机译：由于在选择可用于光源的波长方面的限制，纳米级结构面临技术瓶颈，并且使用当前的光刻和成像技术制备纳米结构非常昂贵。因此，产生纳米压力和制造技术的想法诞生了，以便进一步开发低成本和更可靠的技术来大规模生产纳米器件。这项研究结合了软光刻，光刻胶和气体辅助加压的特性，并研究了使用气体辅助加压和软模压花光刻胶来制造光波导器件，从而使纳米加压技术成为可能。更成熟。研究结果表明，聚二甲基硅氧烷（PDMS）能够使用均匀的压力气体实现与基板表面的完全接触，从而精确地压花并复制纳米级的埋入式波导结构，从而大大增加了有效的加压面积。另外，PDMS软模更容易在短压花时间内制作，以有效降低成本。在制造过程中将气体辅助加压与PDMS软模结合在一起的另一个优势是，PDMS软模在表面上具有较低的自由能，并且难以抵抗粘附。

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