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首页> 外文期刊>Proceedings of the Institution of Mechanical Engineers, Part H. Journal of Engineering in Medicine >Physical properties of ultrafast deposited micro- and nanothickness amorphous hydrogenated carbon films for medical devices and prostheses
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Physical properties of ultrafast deposited micro- and nanothickness amorphous hydrogenated carbon films for medical devices and prostheses

机译：用于医疗器械和假体的超快沉积微米级和纳米级非晶态氢化碳膜的物理性能

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摘要

Hydrogenated amorphous carbon films with diamond-like structures have been formed on different substrates at very low energies and temperatures by a plasma-enhanced chemical vapour deposition (PECVD) process employing acetylene as the precursor gas. The plasma source was of a cascaded arc type with argon as the carrier gas. The films grown at very high deposition rates were found to have a practical thickness limit of ～1.5 μm, above which delamination from the substrate occurred. Deposition on silicon (100), glass, and plastic substrates has been studied and the films characterized in terms of sp{sup}3 content, roughness, hardness, adhesion, and optical properties. Deposition rates of up to 20 nm/s have been achieved at substrate temperatures below 100℃. A typical sp{sup}3 content of 60-75 per cent in the films was determined by X-ray-generated Auger electron spectroscopy (XAES). The hardness, reduced modulus, and adhesion of the films were measured using a MicroMaterials NanoTest indenter/scratch tester. Hardness was found to vary from 4 to 13 GPa depending on the admixed acetylene flow and substrate temperature. The adhesion of the film to the substrate was significantly influenced, by the substrate temperature and whether an in situ d.c. cleaning was employed prior to the deposition process. The hydrogen content in the film was measured by a combination of the Fourier transformation infrared (FTIR) spectroscopy and Rutherford backscattering (RBS) techniques. From the results it is concluded that the films formed by the process described here are ideal for the coating of long-term implantable medical devices, such as prostheses, stents, invasive probes, catheters, biosensors, etc. The properties reported in this publication are comparable with good-quality films deposited by other PECVD methods. The advantages of these films are the low ion energy and temperature of deposition, ensuring that no damage is done to sensitive substrates, very high deposition rates, relatively low capital cost of the equipment required, and the ease of adjustment of plasma parameters, which facilitates film properties to be tailored according to the desired application.
机译：通过使用乙炔作为前驱体气体的等离子体增强化学气相沉积（PECVD）工艺，已在不同的基板上以非常低的能量和温度形成了具有类金刚石结构的氢化非晶碳膜。等离子体源是级联电弧型，以氩气为载气。发现以非常高的沉积速率生长的薄膜具有约1.5μm的实际厚度极限，高于该极限时会发生与基材的分层。已经研究了在硅（100），玻璃和塑料基板上的沉积，并根据sp {sup} 3含量，粗糙度，硬度，附着力和光学特性对薄膜进行了表征。在低于100℃的基板温度下，沉积速率高达20 nm / s。通过X射线产生的俄歇电子能谱（XAES）测定膜中典型的sp 3含量为60-75％。使用MicroMaterials NanoTest压头/划痕测试仪测量薄膜的硬度，降低的模量和附着力。发现硬度根据混合的乙炔流量和基材温度在4 GPa至13 GPa之间变化。膜对基底的粘附力受基底温度和原位直流电的影响很大。在沉积过程之前进行清洁。膜中的氢含量通过傅里叶变换红外（FTIR）光谱和卢瑟福背散射（RBS）技术的组合进行测量。从结果可以得出结论，此处描述的方法形成的膜非常适合用于长期可植入医疗设备的涂层，例如假肢，支架，侵入式探针，导管，生物传感器等。可与其他PECVD方法沉积的高质量薄膜相比。这些薄膜的优点是离子能量和沉积温度低，可确保不会对敏感基材造成损坏，非常高的沉积速率，所需设备的投资成本相对较低以及易于调整等离子体参数，这有助于膜性能可根据所需应用进行调整。

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