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Initial stages of oxide formation on the Zr surface at low oxygen pressure: An in situ FIM and XPS study

机译:低氧压力下Zr表面氧化物形成的初始阶段:原位FIM和XPS研究

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摘要

An improved methodology of the Zr specimen preparation was developed which allows fabrication of stable Zr nanotips suitable for FIM and AP applications. Initial oxidation of the Zr surface was studied on a Zr nanotip by FIM and on a polycrystalline Zr foil by XPS, both at low oxygen pressure (10(-8)-10(-7) mbar). The XPS data reveal that in a first, fast stage of oxidation, a Zr suboxide interlayer is formed which contains three suboxide components (Zr+1, Zr+2 and Zr+3) and is located between the Zr surface and a stoichiometric ZrO2 overlayer that grows in a second, slow oxidation stage. The sole suboxide layer has been observed for the first time at very early states of the oxidation (oxygen exposure <= 4 L). The Ne+ FIM observations are in accord with a two stage process of Zr oxide formation. (C) 2015 The Authors. Published by Elsevier B.V.
机译:开发了一种改进的Zr样品制备方法,可以制备适合FIM和AP应用的稳定Zr纳米尖端。在低氧压(10(-8)-10(-7)mbar)下,通过FIM在Zr纳米尖端和XPS在多晶Zr箔上研究了Zr表面的初始氧化。 XPS数据表明,在氧化的第一个快速阶段,形成了Zr次氧化物中间层,该中间层包含三个次氧化物组分(Zr + 1,Zr + 2和Zr + 3),位于Zr表面和化学计量的ZrO2覆盖层之间在第二个缓慢的氧化阶段中生长。在氧化的非常早的状态下(氧气暴露<= 4 L)首次观察到唯一的次氧化层。 Ne + FIM观测结果符合Zr氧化物形成的两阶段过程。 (C)2015作者。由Elsevier B.V.发布

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