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首页> 外文期刊>Polymer: The International Journal for the Science and Technology of Polymers >Study of the surface glass transition behaviour of amorphous polymer film by scanning-force microscopy and surface spectroscopy
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Study of the surface glass transition behaviour of amorphous polymer film by scanning-force microscopy and surface spectroscopy

机译：用扫描力显微镜和表面光谱研究非晶态聚合物薄膜的表面玻璃化转变行为

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The surface molecular motion of amorphous polymeric solids has been directly measured by lateral force microscopic (LFM), scanning viscoelasticity microscopic (SVM) and differential X-ray photoelectron spectroscopic (D-XPS) measurements. SVM and LFM measurements revealed that the molecular motion on the surface of the monodisperse PS film with Mn less than ca. 30 k was fairly active compared with that in the bulk, mainly due to the surface segregation of chain end groups. The chain end group segregation at the air/PS interface was verified by dynamic secondary ion mass spectroscopic depth profiling of the proton and deuterium ion for end-labelled PS film. These results suggest that surface T-g is depressed because of an increase in free volume near the surface region, induced by the preferential surface localization of chain end groups. D-XPS was utilized for the characterization of surface molecular motion of symmetric poly(styrene-block-methyl methacrylate) diblock copolymer [P(St-b-MMA)] films. It was confirmed by D-XPS that the surface molecular motion of the PS component in [P(St-b-MMA)] diblock copolymer films was gradually activated with decreasing depth from the air/polymer interface. (C) 1998 Elsevier Science Ltd. All rights reserved. [References: 35]
机译：非晶态聚合物固体的表面分子运动已通过横向力显微镜（LFM），扫描粘弹性显微镜（SVM）和差示X射线光电子能谱（D-XPS）直接测量。 SVM和LFM测量结果表明，Mn小于ca的单分散PS膜表面的分子运动。与大部分相比，30 k相当活跃，这主要是由于链端基的表面偏析。通过动态次级离子质谱深度剖析质子和氘离子用于末端标记的PS膜，验证了空气/ PS界面的链端基偏析。这些结果表明，由于链末端基团的优先表面局部化引起的表面区域附近自由体积的增加，表面T-g被抑制。 D-XPS用于表征对称聚（苯乙烯-嵌段-甲基丙烯酸甲酯）二嵌段共聚物[P（St-b-MMA）]薄膜的表面分子运动。通过D-XPS证实，[P（St-b-MMA）]二嵌段共聚物膜中PS组分的表面分子运动随着从空气/聚合物界面的深度减小而逐渐被激活。 （C）1998 Elsevier ScienceLtd。保留所有权利。 [参考：35]

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