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首页> 外文期刊>Chinese science bulletin >Phase evolution of silicide in Nb/Si multilayers
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Phase evolution of silicide in Nb/Si multilayers

机译：Nb / Si多层膜中硅化物的相变

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摘要

With the application of silicide in electronic components and basic research areas, its formation has been a continual concern. Recently, extensive researches into phase evolution have been made in metal/Si systems during annealing at low temperature,but the effects of kinetic and thermodynamic factors on phase selection and phase formation during non-equilibrium deposition has not been known well. For a long time, people have been considering only one phase forming at one moment during annealing process. However, multi-phase coexistence, of which the cause is being in discussion, has often been found between crystalline Si and metal film deposited on it.
机译：随着硅化物在电子元件和基础研究领域中的应用，其形成一直是人们一直关注的问题。近年来，对金属/硅系统在低温退火过程中的相演化进行了广泛的研究，但是动力学和热力学因素对非平衡沉积过程中相选择和相形成的影响尚不清楚。长期以来，人们一直在考虑退火过程中在某一时刻只能形成一个相。然而，经常在结晶硅和沉积在其上的金属膜之间发现多相共存，其原因正在讨论中。

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