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Valence offsets of ternary alloy heterojunctions In_xGa_(1-x)As/In_xAl_(1-x)As

机译:三元合金异质结In_xGa_(1-x)As / In_xAl_(1-x)As的价位偏移

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摘要

The ternary alloy heterojunctions In_xGa_(1-x)As/In_xAl_(1-x)As are important materials which have been widely used in microwave and photoelectric devices. The alloy heterojunctions In_xGa_(1-x)As/In_xAl_(1-x)As (x = 0.3) have great potential use in high electron mobility transistors (HEMTs), heterostructure insulated-gate FFTs (HIGFETs) and resonant tunneling diodes (RTDs). When x rises to 0.53, In_xGa_(1-x)As/In_xAl_(1-x)As can be widely used in the high-speed electronic devices. The valence-band offset (the value of ΔE_v) at semiconductor heterointerface is a key parameter for electronic properties of heterojunction and superlattice, which has great significance in theoretical calculation and experimental research.
机译:三元合金异质结In_xGa_(1-x)As / In_xAl_(1-x)As是重要的材料,已广泛用于微波和光电器件中。合金异质结In_xGa_(1-x)As / In_xAl_(1-x)As(x = 0.3)在高电子迁移率晶体管(HEMT),异质结构绝缘栅FFT(HIGFET)和谐振隧道二极管(RTD)中具有巨大的潜力)。当x上升到0.53时,In_xGa_(1-x)As / In_xAl_(1-x)As可以广泛用于高速电子设备中。半导体异质界面上的价带偏移(ΔE_v的值)是异质结和超晶格电子性质的关键参数,在理论计算和实验研究中具有重要意义。

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