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首页> 外文期刊>Chinese science bulletin >Polishing technology of surface for diamond film using the method of laser ablation
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Polishing technology of surface for diamond film using the method of laser ablation

机译：激光烧蚀法金刚石膜表面抛光技术

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THE chemical vapor deposition (CVD) methods have been developed so much in the past ten years that it has become less expensive to deposit a thick CVD diamond film than to polish the diamond. The polycrystalline films normally exhibit a pronounced roughness because there are lots of large pointed grains on the surface of the films. On the other hand, the thickness unity of diamond film is poor because of the effects of deposition condition, especially for those synthesized by the methods of hot filament CVD (HFCVD) and electron assistant CVD (EACVD). Poor thickness unity and rough surface of thick diamond film limits their potential use in many applications such as optical and electronic devices. Therefore, post-growth polishing of these films is often necessary. The key technology for resolving the problem of thickness unity is to get the same growth rate of diamond film in every spot of the substrate; otherwise, polishing will become very difficult because diamond is the hardest known material. But we could hardly get the same growth rate with the current CVD technology. Polishing the hardest material in nature rapidly and economically requires some new techniques, though polishing of diamond film can be accomplished by mechanical grinding as aconventional method of polishing. Somebody has reported some polishing methods using laser ablation and reaction with transition metal, but still there are some problems to be resolved. In this note, the film with good unity in thickness and smooth on surface can be acquired by the ablation-machine polishing method.
机译：在过去的十年中，化学气相沉积（CVD）方法已经发展得如此之多，以至于沉积厚的CVD金刚石膜比抛光金刚石便宜。多晶膜通常表现出明显的粗糙度，因为在膜的表面上有许多大的尖粒。另一方面，由于沉积条件的影响，尤其是对于通过热丝CVD（HFCVD）和电子辅助CVD（EACVD）的方法合成的沉积条件的影响，金刚石膜的厚度统一性差。厚的金刚石膜的厚度统一性差和粗糙的表面限制了它们在许多应用中的潜在用途，例如光学和电子设备。因此，通常需要对这些膜进行生长后抛光。解决厚度均匀性问题的关键技术是在基板的每个部位都获得相同的金刚石膜生长速率。否则，抛光将变得非常困难，因为金刚石是已知最硬的材料。但是我们很难用当前的CVD技术获得相同的增长率。快速而经济地抛光自然界中最坚硬的材料需要一些新技术，尽管金刚石膜的抛光可以通过机械研磨作为常规的抛光方法来完成。有人报道了一些使用激光烧蚀和与过渡金属反应的抛光方法，但是仍然有一些问题需要解决。在此说明中，可以通过烧蚀机抛光法获得厚度均匀且表面光滑的膜。

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