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首页> 外文期刊>Journal de Physique, IV: Proceedings of International Conference >CVD techniques for gas separation membranes synthesis - characterization - applications
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CVD techniques for gas separation membranes synthesis - characterization - applications

机译：用于气体分离膜合成的CVD技术-表征-应用

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摘要

Membranes used in the separation of gas phase have found a number of important applications. In the past few years, the development of inorganic membranes, which have numerous advantages (thermal and mechanical stabilities, steam cleaning ability...) paved the way for high temperature applications. Inorganic membranes are widely used in gas separation processes such as reversible dehydrogenation reaction. O_2/N_2 separation, CO_2 and volatil organic compounds recovery... Usually, inorganic membranes (SiO_2, Al_2O_3, TiO_2, ZrO_2, Pd...) are deposited on porous substrates in the sol-gel way. CVD techniques can be used as an alternative process for the deposition of very thin films in a wide range of temperature. The membranes deposited belong to the oxide, nitride, carbide and mixted metal compounds. We will present the different CVD techniques used in membranes synthesis: conventional CVD and OMCVD, counterdiffusion CVD, plasma assisted CVD. From a porous substrate, the CVD techniques lead to the pore diameter reduction or film deposition on the top of the membrane and plugs penetrating the pore entrance. Some examples of gas separation membranes coated by CVD will be developed.
机译：已经发现用于气相分离的膜具有许多重要的应用。在过去的几年中，具有许多优点（热和机械稳定性，蒸汽清洁能力...）的无机膜的开发为高温应用铺平了道路。无机膜广泛用于气体分离过程中，例如可逆脱氢反应。 O_2 / N_2分离，CO_2和挥发性有机化合物的回收...通常，无机膜（SiO_2，Al_2O_3，TiO_2，ZrO_2，Pd ...）以溶胶-凝胶方式沉积在多孔基质上。 CVD技术可以用作在宽温度范围内沉积非常薄的薄膜的替代方法。沉积的膜属于氧化物，氮化物，碳化物和混合的金属化合物。我们将介绍膜合成中使用的不同CVD技术：常规CVD和OMCVD，反扩散CVD，等离子辅助CVD。 CVD技术从多孔基材上导致孔径减小或膜沉积在膜的顶部，并且堵塞了孔的入口。将开发通过CVD涂覆的气体分离膜的一些实例。

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