The influence of hydrogen implantation onthe structural, magnetic and electrical properties ofcobalt-copper multilayers was investigated. Hydrogenimplantation increases the bi-layer thickness, theseparation of crystal planes, the remanence andsaturation resistivity, but reduces themagnetoresistance ratio, coercive force, saturationmagnetic field and saturation magnetic moment of themultilayers. The magnetoresistance of the multilayersis relatively unaffected by hydrogen implantation.
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