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Remarkable hydrogen storage properties in three-layered Pd/Mg/Pd thin films

机译:三层Pd / Mg / Pd薄膜中显着的储氢性能

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摘要

We have investigated hydrogen storage and structural properties in nano-composite three-layered Pd(50 nm) /Mg(x nm)/Pd(50 nm) films with x=25, 50, 200, 400 and 800 prepared by an RF-associated magnetron sputtering method. After hydrogenation under a hydrogen gas pressure of 0.1 MPa at 373 K for 24 h, the TDS profiles indicated that the Pd layers contain only 0.15-0.30 mass percent hydrogen, whereas the Mg film contains approx 5.0 mass percent hydrogen for all the films. The most striking feature is that the temperature corresponding to maximum dehydrogenation rate remarkably shifts to low temperature with increasing the thickness of Mg film, which decreased from 465 K at x=25 nm to 360 K at x=800 nm. These improvements could be understood by the concept of cooperative phenomenon which hydrogen shows in nano-scale composite regions.
机译:我们研究了通过RF-RF制备的x = 25、50、200、400和800的纳米复合三层Pd(50 nm)/ Mg(x nm)/ Pd(50 nm)膜中的氢存储和结构性质相关的磁控溅射方法。在373 K的0.1 MPa氢气压力下氢化24小时后,TDS曲线表明Pd层仅包含0.15-0.30质量%的氢,而Mg膜的所有膜均包含约5.0质量%的氢。最显着的特征是,随着Mg膜厚度的增加,与最大脱氢率相对应的温度显着转移到了低温,该温度从x = 25 nm的465 K降低到x = 800 nm的360K。氢在纳米级复合区域显示出的协同现象的概念可以理解这些改进。

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