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首页> 外文期刊>Journal of biomedical materials research, Part A >A physical vapor deposition method for controlled evaluation of biological response to biomaterial chemistry and topography
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A physical vapor deposition method for controlled evaluation of biological response to biomaterial chemistry and topography

机译：一种物理气相沉积方法，可控制地评估对生物材料化学和形貌的生物学响应

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The purpose of this study was to characterize a technique to effectively mask surface chemistry without modifying surface topography. A thin layer of titanium was deposited-hy physical vapor deposition (PVD) onto different biomaterial surfaces. Commercially pure titanium disks were equally divided into three groups. Disks were either polished to a mirror finish, grit blasted with alumina particles, or grit blasted and subsequently plasma sprayed with a commercial grade of hydroxyapatite (HA). A subgroup of each of these treatment types was further treated by masking the entire disk surface with a thin layer of commercially pure titanium deposited by PVD. A comparison of surface topography and chemical composition was carried out between disks within each treatment group. Canine marrow cells were seeded on all disk surfaces to determine the stability of the PVD Ti mask under culture conditions. The PVD process did not significantly alter the surface topography of any samples. The thin titanium layer completely masked the underlying chemistry of the plasma sprayed HA surface and the chemistry of the plasma vapor deposited titanium layer did not differ from that of the commercially pure titanium disks. Aliquots obtained from the media during culture did not indicate any significant differences in Ti concentration amongst the Ti and Ti-masked surfaces. The PVD application of a Ti layer on HA coatings formed a stable, durable, and homogenous layer that effectively masked the underlying surface chemistry without altering the surface topography.
机译：这项研究的目的是描述一种有效掩盖表面化学而不改变表面形貌的技术。通过物理气相沉积（PVD）将钛薄层沉积到不同的生物材料表面上。商业纯钛圆盘均分为三组。将圆盘抛光至镜面光洁度，用氧化铝颗粒喷砂处理或喷砂处理，然后用工业级羟基磷灰石（HA）等离子喷涂。通过用PVD沉积的一层商业纯钛薄层覆盖整个磁盘表面，进一步处理了每种处理类型的一个子组。在每个治疗组内的椎间盘之间进行表面形貌和化学组成的比较。将犬骨髓细胞接种在所有盘表面上，以确定在培养条件下PVD Ti面膜的稳定性。 PVD工艺不会明显改变任何样品的表面形貌。薄的钛层完全掩盖了等离子喷涂HA表面的基本化学性质，等离子气相沉积的钛层的化学性质与市售纯钛圆盘的化学性质没有区别。在培养过程中从培养基中获得的等分试样在Ti和Ti掩蔽的表面之间没有显示出Ti浓度的任何显着差异。在HA涂层上进行TiD涂层的PVD涂层可形成稳定，耐用且均匀的涂层，可有效掩盖下面的表面化学成分，而不会改变表面形貌。

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