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首页> 外文期刊>Journal of biomedical materials research. Part B, Applied biomaterials. >A complete characterization of Ca5(PO4)3OH sputter-deposited films by ion beam analysis: RBS and ERD.
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A complete characterization of Ca5(PO4)3OH sputter-deposited films by ion beam analysis: RBS and ERD.

机译：通过离子束分析对Ca5（PO4）3OH溅射沉积膜的完整表征：RBS和ERD。

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RF magnetron sputter deposition was used to deposit thin calcium phosphate (hydroxyapatite) layers on titanium alloy substrate material. We determined the precise amount of calcium, phosphorus, oxygen, and hydrogen in these films by combining two ion-beam analysis techniques: Rutherford backscattering spectrometry (RBS) and elastic recoil detection (ERD). Variables were power level, partial oxygen pressure, or additional water vapor. Also examined was the influence of additional bias power to the substrates during deposition and the effect of annealing on the final composition of the deposited layers. Measurements showed that the Ca/P ratio decreased with increasing oxygen pressure or decreasing sputtering power. In addition, the Ca/P ratio increased when a bias was applied to the substrates. The O/P ratio of the films decreased with additional oxygen pressure but increased when additional water vapor was applied during deposition. All as-deposited films showed a higher hydrogen content than stoichiometric HA. The hydrogen content in the films deposited with water vapor was more than 7 times higher than in the films deposited under pure argon conditions. After annealing, the hydrogen content decreased to about 3.5 at % whereas in stoichiometric HA the hydrogen content amounts to 4.5 at %. After annealing, the oxygen concentration in the film also decreased. We assume that hydrogen disappears out of the film as H2O during annealing. For the targets used in these experiments, sputter deposition at 400 W, with additional water vapor and annealing at 500 degrees C, produced films with a stoichiometry closest to that of hydroxyapatite.
机译：RF磁控溅射沉积用于在钛合金基底材料上沉积磷酸钙（羟基磷灰石）薄层。我们通过结合两种离子束分析技术确定了这些薄膜中钙，磷，氧和氢的精确含量：卢瑟福背散射光谱（RBS）和弹性反冲检测（ERD）。变量为功率水平，氧气分压或其他水蒸气。还检查了沉积过程中附加偏置功率对基板的影响以及退火对沉积层最终成分的影响。测量表明，Ca / P比随氧气压力的增加或溅射功率的降低而降低。另外，当将偏压施加到基板上时，Ca / P比增加。膜的O / P比随着附加的氧气压力而降低，但是当在沉积期间施加附加的水蒸气时，其O / P比增加。所有沉积的薄膜均显示出高于化学计量HA的氢含量。用水蒸气沉积的薄膜中的氢含量是在纯氩气条件下沉积的薄膜中氢含量的7倍以上。退火后，氢含量降至约3.5 at％，而在化学计量HA中，氢含量为4.5 at％。退火后，膜中的氧浓度也降低。我们假设在退火过程中氢以H2O的形式从薄膜中消失。对于这些实验中使用的靶材，在400 W的条件下进行溅射沉积，并添加水蒸气，并在500摄氏度下进行退火，制得的化学计量最接近羟基磷灰石的薄膜。

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