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首页> 外文期刊>Journal of engineering physics and thermophysics >PHOTOEMISSION MEASUREMENTS OF TEMPERATURE IN PULSED LASER HEATING OF VARIOUS MATERIALS
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PHOTOEMISSION MEASUREMENTS OF TEMPERATURE IN PULSED LASER HEATING OF VARIOUS MATERIALS

机译:各种材料的脉冲激光加热中的光致增生温度测量

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摘要

The possibilities for the photoemission method of measuring the temperature of various materials heated by millisecond laser pulses have been investigated. The temperature of graphite, tungsten, tantalum, silicon plates, and silicon dioxide films was determined experimentally with a time resolution of 1 μs within the range 1200-2900 K.
机译:已经研究了用于测量由毫秒激光脉冲加热的各种材料的温度的光发射方法的可能性。实验确定了石墨,钨,钽,硅片和二氧化硅膜的温度,时间分辨率为1200-2900 K,范围为1μs。

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