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首页> 外文期刊>Journal of industrial and engineering chemistry >Preparation of TiO2 thin films on glass beads by a rotating plasma reactor
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Preparation of TiO2 thin films on glass beads by a rotating plasma reactor

机译：旋转等离子体反应器在玻璃微珠上制备TiO2薄膜

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摘要

We experimentally coated the TiO2 thin films on the glass beads by a rotating cylindrical plasma chemical vapor deposition (PCVD) process. The precursors for the thin films were generated by the plasma reactions, and they deposited on the glass beads to become the grains on the films. The TiO2 thin films grow more quickly on the glass beads by increasing the reactor pressure, or the rotation speed of the reactor. As the applied power increases, the thickness of the thin films on the glass beads decreases. As the thickness of the TiO2 thin films increases, the uniformity of the TiO2 thin films decreases due to the deposition of larger grains or due to the increase of crack size. The rotating cylindrical PCVD process can be a good method to prepare the particles coated with metal or organic-doped thin films for highly functionalized materials.
机译：我们通过旋转圆柱等离子化学气相沉积（PCVD）工艺在玻璃珠上涂覆TiO2薄膜。薄膜的前体是通过等离子体反应生成的，它们沉积在玻璃珠上，成为薄膜上的颗粒。通过增加反应器压力或反应器的旋转速度，TiO2薄膜在玻璃珠上的生长更快。随着施加功率的增加，玻璃珠上的薄膜厚度减小。随着TiO 2薄膜的厚度增加，由于较大晶粒的沉积或由于裂纹尺寸的增加，TiO 2薄膜的均匀性降低。旋转圆柱形PCVD工艺可能是制备用金属或有机掺杂薄膜涂覆的颗粒以用于高度功能化材料的好方法。

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