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首页> 外文期刊>Journal of Materials Science >RF sputtering deposition of MgMn2O4 spinel thin films
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RF sputtering deposition of MgMn2O4 spinel thin films

机译：射频溅射沉积MgMn2O4尖晶石薄膜

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In this paper we describe about the synthesis of MgMn2O4 thin films by means of off-axis RF magnetron sputtering and their structural and morphological characterisation realised by means of X-ray diffraction (XRD), micro-Raman spectroscopy and Scanning Electron Microscopy (SEM). We explored different synthesis conditions, namely the substrate temperature, T-s, and the sputtering gas composition and we could observe that well-crystallised films are obtained at T-s = 500degreesC while the effect of the sputtering gas composition is to affect the structural properties of the films deposited. The thin films deposited always present a crystal structure less distorted with respect to the one of the target material. The possibility of synthesising films of low distorted spinels or even cubic ones may be an interesting way of preparing buffering layers for the growth of isostructural materials such as other spinels or pseudocubic perovskites. (C) 2004 Kluwer Academic Publishers. [References: 16]
机译：在本文中，我们描述了通过离轴RF磁控溅射合成MgMn2O4薄膜及其通过X射线衍射（XRD），显微拉曼光谱和扫描电子显微镜（SEM）实现的结构和形态表征。我们探索了不同的合成条件，即衬底温度，Ts和溅射气体组成，我们可以观察到在Ts = 500℃下获得了良好结晶的薄膜，而溅射气体组成的影响将影响薄膜的结构性能存放。沉积的薄膜总是具有相对于靶材材料之一失真较小的晶体结构。合成低畸变尖晶石或什至立方晶状尖晶石的薄膜的可能性可能是制备缓冲层的有趣方法，该缓冲层用于生长诸如其他尖晶石或假立方钙钛矿的同质结构材料。 （C）2004 Kluwer学术出版社。 [参考：16]

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