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首页> 外文期刊>Journal of Materials Science >Effect of 80 MeV oxygen ion beam irradiation on the properties of CdTe thin films
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Effect of 80 MeV oxygen ion beam irradiation on the properties of CdTe thin films

机译：80 MeV氧离子束辐照对CdTe薄膜性能的影响

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摘要

Polycrystalline CdTe thin films were irradiated with 80 MeV oxygen (O6+) ions for various fluences and its effect on the composition, structure, surface topography and optical properties have been investigated. The as-grown films are found to be slightly Te-rich in composition and there is no significant change in the composition after irradiation. X-ray diffraction analysis shows a high degree of crystallite orientation along the (111) plane of cubic phase CdTe. Upon irradiation a large decrease in intensity of the (111) plane and a small shift in the peak position has been resulted. The shift in the peak position is correlated with the change in the residual stress. The surface roughness of the films get increased after irradiation. A decrease in the grain size was observed after irradiation due to ion-induced recrystallization. The optical band gap energy decreased from 1.53 eV for as-grown film to 1.46 eV upon irradiation. The photoluminescence (PL) spectrum is dominated by the defect band and the effect of irradiation has been discussed and correlated with the observed change in the XRD peak position and optical band gap.
机译：用80 MeV氧（O6 +）离子辐照多晶CdTe薄膜，以实现不同的通量，并研究了其对组成，结构，表面形貌和光学性能的影响。发现所生长的膜在组成上稍微富Te，并且在辐照后组成没有明显变化。 X射线衍射分析显示，沿立方相CdTe的（111）平面具有高度的微晶取向。照射后，导致（111）面的强度大大降低，并且峰位置的位移很小。峰值位置的变化与残余应力的变化相关。辐照后膜的表面粗糙度增加。由于离子诱导的重结晶，在辐射后观察到晶粒尺寸减小。辐照后，光学带隙能量从成膜的1.53 eV降低到1.46 eV。光致发光（PL）谱由缺陷带占主导地位，并且已经讨论了辐照的影响并将其与XRD峰位置和光学带隙的观察到的变化相关。

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