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首页> 外文期刊>Journal of Macromolecular Science. Pure and Applied Chemistry >Atmospheric Pressure Plasma Deposition of Polyfuran
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Atmospheric Pressure Plasma Deposition of Polyfuran

机译：聚呋喃的大气压等离子体沉积

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摘要

The atmospheric pressure radiofrequency (RF) plasma polymerization of furan was carried out with the objective of synthesizing polyfuran thin film. The structure, compositions and morphology of the plasma deposited polyfuran film were investigated by Fourier transform infrared (FTIR), atomic force microscopy (AFM), ultraviolet-visible absorption spectroscopy (UV-vis) and thermogravimetric analysis (TGA). The formation of polyfuran was confirmed using FTIR and UV-visible analysis. The properties of plasma-deposited polyfuran were compared with those of chemically synthesized polyfuran. Although the plasma deposited thin film polyfuran shows lower thermal stability than that of chemically synthesized polyfuran. It has better solubility in CHCl3, also. Thin uniform polyfuran films are obtained in plasma assisted polyfuran deposition, while particles are obtained in chemical polyfuran polymerization.
机译：以合成呋喃薄膜为目的，进行呋喃的大气压射频（RF）等离子体聚合。通过傅立叶变换红外光谱（FTIR），原子力显微镜（AFM），紫外可见吸收光谱（UV-vis）和热重分析（TGA）研究了等离子体沉积的聚呋喃薄膜的结构，组成和形态。使用FTIR和UV-可见分析确认了聚呋喃的形成。比较了等离子体沉积的聚呋喃和化学合成的聚呋喃的性能。尽管等离子体沉积的薄膜聚呋喃显示出比化学合成聚呋喃低的热稳定性。它在CHCl3中的溶解性也更好。在等离子体辅助的聚呋喃沉积中可获得均匀的聚呋喃薄膜，而在化学聚呋喃聚合中可获得颗粒。

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