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首页> 外文期刊>Journal of Materials Engineering and Performance >Assessment of techniques for characterizing the surface quality of ground silicon nitride
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Assessment of techniques for characterizing the surface quality of ground silicon nitride

机译：评估表征氮化硅表面质量的技术

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摘要

This study evaluates techniques used to detect and quantify the extent of surface and subsurface damage in ground silicon nitride. Specimens of two differently ground surfaces of a hot isostatically pressed (HIP) silicon nitride, commerciallydesignated as GS-44, were subjected to six types of analyses, namely mechanical stylus profiling, atomic force microscopy, point-counting analysis of fragmentation pits, laser-light scattering, optical gating, and grazing incidence x-ray diffraction(GIXD). The results of these investigations are compared and discussed. The techniques providing the clearest correlations with grinding conditions were mechanical stylus roughness, fragmentation analysis, and GIXD (residual stress conditions). Those that exhibited some correlation but appear to require more work to develop a reliable evaluation method were laser scattering and optical gating. Atomic force microscopy was useful, but not as a routine investigative tool for quality control in ceramicmachining. The techniques that appear to have the most near-term potential for routine use are fragmentation analysis and optical gating. Laser-based optical scattering exhibits potential for routine application, but, more development is needed for itscommercialization.
机译：这项研究评估了用于检测和量化地面氮化硅表面和亚表面损伤程度的技术。对商品名为GS-44的热等静压（HIP）氮化硅的两个不同研磨表面的样品进行了六种类型的分析，即机械测针轮廓分析，原子力显微镜检查，碎裂点的点计数分析，激光-光散射，光学选通和掠入射x射线衍射（GIXD）。这些调查的结果进行了比较和讨论。提供与磨削条件最明显关联的技术是机械测针粗糙度，碎片分析和GIXD（残余应力条件）。那些表现出一定相关性但似乎需要更多工作才能开发出可靠的评估方法的是激光散射和光学选通。原子力显微镜是有用的，但不能用作陶瓷加工质量控制的常规研究工具。看起来最常用于常规用途的技术是碎片分析和光学选通。基于激光的光散射具有常规应用的潜力，但是，其商业化需要更多的发展。

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