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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Adequacy test of the fictive temperatures of silica glasses determined by IR spectroscopy
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Adequacy test of the fictive temperatures of silica glasses determined by IR spectroscopy

机译：用红外光谱法测定石英玻璃的假想温度是否足够

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Adequacy of the fictive temperature determined by the IR spectroscopy method was examined for various silica glasses by measuring the extent of the memory effect. The IR method of fictive temperature measurement of silica glasses relies upon the assumption that a silica glass has a silica structural band with a unique wavenumber when it has a particular fictive temperature. Silica glasses with various impurities or added components such as Cl, F, and OH were given a cross-over heat-treatment and the extent of the resulting deviation of the wavenumber during the second stage heat-treatment at a constant temperature corresponding to the apparent fictive temperature of the sample was determined. Silica glasses containing high concentrations of water or fluorine exhibited distinct memory effects while glasses with low water concentration or Cl did not. These results seem to indicate that the main source of the memory effect in silica glasses is the composition fluctuation rather than density fluctuation. Thus, the IR method of determining the fictive temperature is adequate for high purity silica glasses even when the glass samples have unknown thermal history. (c) 2005 Elsevier B.V. All rights reserved.
机译：通过测量记忆效应的程度，检查了通过红外光谱法确定的虚拟温度是否适合各种石英玻璃。二氧化硅玻璃的虚构温度测量的IR方法基于这样的假设：当二氧化硅玻璃具有特定的虚构温度时，其具有具有唯一波数的二氧化硅结构带。对具有各种杂质或添加的成分（如Cl，F和OH）的石英玻璃进行交叉热处理，并且在恒定温度下的第二阶段热处理期间，波数偏差的程度与表观温度相对应。测定样品的假想温度。含有高浓度水或氟的石英玻璃表现出明显的记忆效应，而低浓度或Cl的玻璃则没有。这些结果似乎表明，石英玻璃中记忆效应的主要来源是成分波动而不是密度波动。因此，即使玻璃样品具有未知的热历史，用于测定假想温度的IR方法也适用于高纯度石英玻璃。 （c）2005 Elsevier B.V.保留所有权利。

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