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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Microstructure and surface roughness of microcrystalline silicon prepared by very high frequency-glow discharge using hydrogen dilution
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Microstructure and surface roughness of microcrystalline silicon prepared by very high frequency-glow discharge using hydrogen dilution

机译：用氢稀释法通过极高频辉光放电制备的微晶硅的微观结构和表面粗糙度

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摘要

The microstructure of a series of silicon films deposited by Very high frequency glow discharge (VHF-GD) with silane concentration in hydrogen Varying from 100% down to 1.25% has been observed with transmission electron microscopy (TEM). The surface topography of the layers has been analysed by atomic force microscopy (AFM). At silane concentration below 8.6%, a phase transition between amorphous hydrogenated silicon (a-Si:H) and microcrystalline silicon (mu c-Si:H) is observed by TEM. After this transition, the further decrease of silane concentration leads to complex changes of the crystalline microstructure of the layers. AFM observations of the surface reveal that the film rms roughness increases with the decrease of the silane concentration. The surface morphology is not related simply to the microstructure of crystalline grains as observed by TEM. (C) 2000 Published by Elsevier Science B.V. All rights reserved. [References: 12]
机译：用透射电子显微镜（TEM）观察到通过氢在水中硅烷浓度从甚高频辉光放电（VHF-GD）沉积的一系列硅膜的微观结构。这些层的表面形貌已经通过原子力显微镜（AFM）进行了分析。在硅烷浓度低于8.6％时，通过TEM观察到非晶态氢化硅（a-Si：H）和微晶硅（μc-Si：H）之间的相变。在该转变之后，硅烷浓度的进一步降低导致层的晶体微观结构的复杂变化。 AFM对表面的观察表明，膜均方根粗糙度随硅烷浓度的降低而增加。如通过TEM观察到的，表面形态不仅仅与晶粒的微观结构有关。 （C）2000，Elsevier Science B.V.保留所有权利。 [参考：12]

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